SEMI International Standards
Standards Locale: North America
Committee: Micropatterning
Place of Meeting: San Francisco Marriott Marquis, San Francisco, California
Date of Meeting: 07/11/2017
Meeting End Date: 07/11/2017
Recording SEMI Standards Staff: Kevin Nguyen
CER Posted to Web: 07/24/2017


Leadership Changes

WG/TF/SC/TC Name
Previous Leader
New Leader
Microlithography TC ChapterWes Erck is retired
Committee Structure Changes

Previous WG/TF/SC Name
New WG/TF/SC Name or Status Change
Patterning Metrology Task Force (new TF)


Ballot Results
None.

Ratification Ballot Results
None.

Activities Approved by the GCS between meetings of TC Chapter meeting
None.

Authorized Activities

#
Type
SC/TF/WG
Details
tbdSNARFPatterning Metrology Task ForceRevision to SEMI P18-92 (Reapproved 1104)
SPECIFICATION FOR OVERLAY CAPABILITIES OF WAFER STEPPERS (pending two weeks members review)
tbdSNARFPatterning Metrology Task ForceLine Item revision to SEMI P19-92 (Reapproved 0707)
SPECIFICATION FOR METROLOGY PATTERN CELLS FOR INTEGRATED CIRCUIT MANUFACTURE


Authorized Ballots
None.

SNARF(s) Granted a One-Year Extension
None.

SNARF(s) Cancelled
None.

Standard(s) to receive Inactive Status
None.

Special Announcements of the Committee (Workshops, Programs, etc.)
None.

Next Meeting
July 10, 2018 (tentative) in conjunction with SEMICON West 2018 in San Francisco, CA. Check www.semi.org/standards under calendar for latest update.