SEMI International Standards
Standards Locale: Europe |
Committee: Silicon Wafer |
Place of Meeting: Grenoble, France |
Date of Meeting: 10/08/2014 |
Meeting End Date: 10/08/2014 |
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Recording SEMI Standards Staff: James Amano |
CER Posted to Web: 10/19/2014 |
Leadership Changes
None.
Committee Structure Changes
None.
Ballot Results
Document # | Document Title | Committee Action | A&R Forms for Approved Ballots |
5403 | Withdrawal of SEMI MF534-0707, TEST METHOD FOR BOW OF SILICON WAFERS | Passed as balloted | |
5604 | Line Item Revision to SEMI M1-0414 SPECIFICATIONS FOR POLISHED SINGLE CRYSTAL SILICON WAFERS and SEMI M20-1110 PRACTICE FOR ESTABLISHING A WAFER COORDINATE SYSTEM | Passed as balloted | |
5702 | Line Item Revision to SEMI M68-1109, PRACTICE FOR DETERMINING WAFER NEAR-EDGE GEOMETRY FROM A MEASURED HEIGHT DATA ARRAY USING A CURVATURE METRIC, ZDD | Passed with editorial changes | |
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
None.
Authorized Activities
Authorized Ballots
# | When | SC/TF/WG | Details |
5736 | Cycle 7-2014 | International SOI Wafers Task Force | Line Item Revision to M41-1213 Specification of Silicon-on-Insulator (SOI) for Power Device/ICs |
SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
None.
Special Announcements of the Committee (Workshops, Programs, etc.)
None.
Next Meeting
October, 2015, during SEMICON Europa in Dresden, Germany
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