SEMI International Standards
Standards Locale: Japan |
Committee: Silicon Wafer |
Place of Meeting: SEMI Japan Office ,Tokyo, Japan |
Date of Meeting: 03/11/2016 |
Meeting End Date: 03/11/2016 |
|
Recording SEMI Standards Staff: Junko Collins |
CER Posted to Web: 03/18/2016 |
Leadership Changes
None.
Committee Structure Changes
None.
Ballot Results
Document # | Document Title | Committee Action | A&R Forms for Approved Ballots |
5976 | REAPPROVAL OF SEMI M45-1110, SPECIFICATION FOR 300mm WAFER SHIPPING SYSTEM | Passed as balloted | 5975_Ballot report_2016.03.11a.pdf |
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
None.
Authorized Activities
# | Type | SC/TF/WG | Details |
TBD | SANRF | Epitaxial Wafer TF | Revised SNARF 5911 “Line Item Revision of SEMI M62-0515, Specifications for Silicon Epitaxial Wafers” to major revision, “Revision of SEMI M62-0515, Specifications for Silicon Epitaxial Wafers”. |
TBD | SANRF | Int’l Advanced Automated Surface Inspection TF | Revision of SEMI MF1811-xxxx GUIDE FOR ESTIMATING THE POWER SPECTRAL DENSITY FUNCTION AND RELATED FINISH PARAMETERS FROM SURFACE PROFILE DATA |
Authorized Ballots
# | When | SC/TF/WG | Details |
5737A | Cycle4 - 6 | International Test Method TF | SEMI Draft Document 5737A
REVISION OF SEMI MF1391-1107 (Reapproved 0912)
TEST METHOD FOR SUBSTITUTIONAL ATOMIC CARBON CONTENT OF SILICON BY INFRARED ABSORPTION |
SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
None.
Special Announcements of the Committee (Workshops, Programs, etc.)
None.
Next Meeting
Friday, June 10, 2016, 13:30-17:00,
Meeting Room, SEMI Japan Office, Tokyo, Japan
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