SEMI International Standards
Standards Locale: Japan
Committee: Silicon Wafer
Place of Meeting: SEMI Japan Office ,Tokyo, Japan
Date of Meeting: 03/11/2016
Meeting End Date: 03/11/2016
Recording SEMI Standards Staff: Junko Collins
CER Posted to Web: 03/18/2016


Leadership Changes
None.

Committee Structure Changes
None.

Ballot Results


Document #
Document Title
Committee Action
A&R Forms for Approved Ballots
5976REAPPROVAL OF SEMI M45-1110, SPECIFICATION FOR 300mm WAFER SHIPPING SYSTEMPassed as balloted5975_Ballot report_2016.03.11a.pdf5975_Ballot report_2016.03.11a.pdf




Ratification Ballot Results
None.

Activities Approved by the GCS between meetings of TC Chapter meeting
None.

Authorized Activities


#
Type
SC/TF/WG
Details
TBDSANRFEpitaxial Wafer TFRevised SNARF 5911 “Line Item Revision of SEMI M62-0515, Specifications for Silicon Epitaxial Wafers” to major revision, “Revision of SEMI M62-0515, Specifications for Silicon Epitaxial Wafers”.
TBDSANRFInt’l Advanced Automated Surface Inspection TFRevision of SEMI MF1811-xxxx GUIDE FOR ESTIMATING THE POWER SPECTRAL DENSITY FUNCTION AND RELATED FINISH PARAMETERS FROM SURFACE PROFILE DATA



Authorized Ballots


#
When
SC/TF/WG
Details
5737ACycle4 - 6International Test Method TFSEMI Draft Document 5737A
REVISION OF SEMI MF1391-1107 (Reapproved 0912)
TEST METHOD FOR SUBSTITUTIONAL ATOMIC CARBON CONTENT OF SILICON BY INFRARED ABSORPTION




SNARF(s) Granted a One-Year Extension
None.

SNARF(s) Cancelled
None.

Standard(s) to receive Inactive Status
None.

Special Announcements of the Committee (Workshops, Programs, etc.)
None.

Next Meeting

Friday, June 10, 2016, 13:30-17:00,
Meeting Room, SEMI Japan Office, Tokyo, Japan