SEMI International Standards
Standards Locale: Japan |
Committee: Micropatterning |
Place of Meeting: SEMI Japan, Tokyo, Japan |
Date of Meeting: 10/08/2014 |
Meeting End Date: 10/08/2014 |
|
Recording SEMI Standards Staff: Naoko Tejima |
CER Posted to Web: 10/22/2014 |
Leadership Changes
None.
Committee Structure Changes
None.
Ballot Results
Document # | Document Title | CommitteeAction | A&R Forms forApproved Ballots |
5229 | Revision to SEMI P44-0211, Specification for Open Artwork System interchange Standard (OASIS®) Specific to Mask Tools | Passed
with editorial changes | |
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
None.
Authorized Activities
None.
Authorized Ballots
None.
SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
None.
Special Announcements of the Committee (Workshops, Programs, etc.)
None.
Next Meeting
SEMI Japan Standards Winter 2015 Meetings
Wednesday, January 21, 2015, 15:30-17:00, SEMI Japan, Ichigaya, Tokyo
Copyright ©2024 Semiconductor Equipment and Materials International (SEMI®). All rights reserved.