SEMI International Standards
Standards Locale: Japan
Committee: Micropatterning
Place of Meeting: SEMI Japan, Tokyo, Japan
Date of Meeting: 10/08/2014
Meeting End Date: 10/08/2014
Recording SEMI Standards Staff: Naoko Tejima
CER Posted to Web: 10/22/2014


Leadership Changes
None.

Committee Structure Changes
None.

Ballot Results

Document #
Document Title
CommitteeAction
A&R Forms forApproved Ballots
5229Revision to SEMI P44-0211, Specification for Open Artwork System interchange Standard (OASIS®) Specific to Mask ToolsPassed
with editorial changes


Ratification Ballot Results
None.

Activities Approved by the GCS between meetings of TC Chapter meeting
None.

Authorized Activities
None.

Authorized Ballots
None.

SNARF(s) Granted a One-Year Extension
None.

SNARF(s) Cancelled
None.

Standard(s) to receive Inactive Status
None.

Special Announcements of the Committee (Workshops, Programs, etc.)
None.

Next Meeting
SEMI Japan Standards Winter 2015 Meetings
Wednesday, January 21, 2015, 15:30-17:00, SEMI Japan, Ichigaya, Tokyo