SEMI International Standards
Standards Locale: North America
Committee: Microlithography
Place of Meeting: SEMI HQ, San Jose, CA
Date of Meeting: 11/08/2016
Meeting End Date: 11/08/2016
Recording SEMI Standards Staff: Kevin Nguyen
CER Posted to Web: 11/09/2016


Leadership Changes
None.

Committee Structure Changes
None.

Ballot Results

Document #
Document Title
Committee Action
A&R Forms for Approved Ballots
6040Line Item Revision to SEMI P44-0316 Specification for Open Artwork System Interchange Standard (OASIS®) Specific to Mask ToolsPassed with editorial changes6040_Procedural Review.pdf6040_Procedural Review.pdf
.

Ratification Ballot Results
None.

Activities Approved by the GCS between meetings of TC Chapter meeting
None.

Authorized Activities
None.

Authorized Ballots
None.

SNARF(s) Granted a One-Year Extension
None.

SNARF(s) Cancelled
None.

Standard(s) to receive Inactive Status
None.

Special Announcements of the Committee (Workshops, Programs, etc.)
None.

Next Meeting
July 12, 2017 in San Francisco, CA in conjunction with SEMICON West