SEMI International Standards
Standards Locale: North America |
Committee: Microlithography |
Place of Meeting: SEMI HQ, San Jose, CA |
Date of Meeting: 11/08/2016 |
Meeting End Date: 11/08/2016 |
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Recording SEMI Standards Staff: Kevin Nguyen |
CER Posted to Web: 11/09/2016 |
Leadership Changes
None.
Committee Structure Changes
None.
Ballot Results
Document # | Document Title | Committee Action | A&R Forms for Approved Ballots |
6040 | Line Item Revision to SEMI P44-0316 Specification for Open Artwork System Interchange Standard (OASIS®) Specific to Mask Tools | Passed with editorial changes | 6040_Procedural Review.pdf |
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Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
None.
Authorized Activities
None.
Authorized Ballots
None.
SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
None.
Special Announcements of the Committee (Workshops, Programs, etc.)
None.
Next Meeting
July 12, 2017 in San Francisco, CA in conjunction with SEMICON West
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