SEMI International Standards
Standards Locale: North America |
Committee: Silicon Wafer |
Place of Meeting: KLA-Tencor, Milpitas, California |
Date of Meeting: 04/04/2017 |
Meeting End Date: 04/04/2017 |
|
Recording SEMI Standards Staff: James Amano |
CER Posted to Web: 04/12/2017 |
Leadership Changes
None.
Committee Structure Changes
None.
Ballot Results
None.
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
None.
Authorized Activities
# | SC/TF/WG | Details |
5915 | Int’l Advanced Wafer Geometry TF | Line Item Revision to SEMI M1-1016, Addition to Related Information: Illustration of Flatness Metrics for Silicon Wafers SNARF REVISED to remove “shape” from title, rationale, and scope |
6168 | Int’l Advanced Wafer Geometry TF | Line Item revision to add new Related Information about area (sector) exclusions for the ERO-related standards M67-1015: Test Method For Determining Wafer Near-Edge Geometry From A Measured Thickness Data Array Using The ESFQR, ESFQD AND ESBIR Metrics and M68-1015 Test Method For Determining Wafer Near-Edge Geometry From A Measured Height Data Array Using A Curvature Metric, ZDD |
6169 | Int’l Advanced Wafer Geometry TF | Line Item Revision to MF1390-1014: Test Method For Measuring Bow And Warp On Silicon Wafer By Automated Noncontact Scanning to add Bow Bestfit metric |
6170 | Int’l Advanced Wafer Geometry TF | Line item Revision to SEMI M49 “Guide For Specifying Geometry Measurement Systems For Silicon Wafers For The 130 nm TO 16 nm Technology Generations |
Authorized Ballots
# | When | TF | Details |
5915 | Cycle 5-2017 | Int’l Advanced Wafer Geometry TF | Line Item Revision to SEMI M1-1016, Addition to Related Information: Illustration of Flatness Metrics for Silicon Wafers |
6019A | Cycle 5-2017 | International Polished Wafers Task Force | Line item revision of SEMI M1-0416, Specification for Polished Single Crystal Silicon Wafers |
6041 | Cycle 5-2017 | International Advanced Wafer Geometry Task Force | Line Item revision of M21-1110 Guide For Assigning Addresses To Rectangular Elements In A Cartesian Array |
6042A | Cycle 5-2017 | International Test Methods Task Force | Line Item Revision to SEMI MF1763-0706 (Reapproved 1111)Test Methods for Measuring Contrast of a Linear Polarizer
(Title correction for conformance) |
6096 | Cycle 5-2017 | International Automated Advanced Surface Inspection Task Force | Line Item Revision to SEMI M53-0216 Practice for Calibrating Scanning Surface Inspection Systems Using Certified Depositions of Monodispere Reference Spheres on Unpatterned Semiconductor Wafer Surfaces (Addition of a related information section to SEMI M53 regarding the relationship of calibrated sizes assigned to defects by surface inspection systems to their actual physical size) |
6169 | Cycle 5-2017 | Int’l Advanced Wafer Geometry TF | Line Item Revision to MF1390-1014: Test Method For Measuring Bow And Warp On Silicon Wafer By Automated Noncontact Scanning to add Bow Bestfit metric |
SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
None
Special Announcements of the Committee (Workshops, Programs, etc.)
None.
Next Meeting
SEMICON West 2017. Check http://www.semi.org/en/standards-events for details.
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