SEMI International Standards
Standards Locale: North America
Committee: Microlithography
Place of Meeting: San Francisco Marriott Marquis, California
Date of Meeting: 07/12/2016
Meeting End Date: 07/12/2016
Recording SEMI Standards Staff: Kevin Nguyen
CER Posted to Web: 07/19/2016


Leadership Changes
None.

Committee Structure Changes
None.

Ballot Results
None.

Ratification Ballot Results
None.

Activities Approved by the GCS between meetings of TC Chapter meeting
None.

Authorized Activities

#
Type
SC/TF/WG
Details
6040SNARFData Path TFLine Item Revision to SEMI P44-0316 Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask Tools


Authorized Ballots
None.

SNARF(s) Granted a One-Year Extension
None.

SNARF(s) Cancelled
None.

Standard(s) to receive Inactive Status
None.

Special Announcements of the Committee (Workshops, Programs, etc.)
None.

Next Meeting
March 1, 2017 (6-8 PM PDT) San Jose, California in conjunction with SPIE 2017. Check www.semi.org/en/standards for details.