SEMI International Standards
Standards Locale: North America |
Committee: Microlithography |
Place of Meeting: San Francisco Marriott Marquis, California |
Date of Meeting: 07/12/2016 |
Meeting End Date: 07/12/2016 |
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Recording SEMI Standards Staff: Kevin Nguyen |
CER Posted to Web: 07/19/2016 |
Leadership Changes
None.
Committee Structure Changes
None.
Ballot Results
None.
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
None.
Authorized Activities
# | Type | SC/TF/WG | Details |
6040 | SNARF | Data Path TF | Line Item Revision to SEMI P44-0316 Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask Tools |
Authorized Ballots
None.
SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
None.
Special Announcements of the Committee (Workshops, Programs, etc.)
None.
Next Meeting
March 1, 2017 (6-8 PM PDT) San Jose, California in conjunction with SPIE 2017. Check www.semi.org/en/standards for details.
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