SEMI International Standards
Standards Locale: Japan
Committee: Micropatterning
Place of Meeting: SEMI Japan, Tokyo, Japan
Date of Meeting: 02/05/2015
Meeting End Date: 02/05/2015
Recording SEMI Standards Staff: Naoko Tejima
CER Posted to Web: 02/05/2015


Leadership Changes
None.

Committee Structure Changes
None.

Ballot Results
None.

Ratification Ballot Results
None.

Activities Approved by the GCS between meetings of TC Chapter meeting
None.

Authorized Activities

#
Type
SC/TF/WG
Details
5229A
Information (Blue) Ballot
(the mid of Feb – the mid of Mar.)		Mask Data Format for Mask Tools Task Force Revision to SEMI P44-0211, Specification for Open Artwork System interchange Standard (OASIS®) Specific to Mask Tools


Authorized Ballots

#
When
SC/TF/WG
Details
5229A
Cycle 4Mask Data Format for Mask Tools Task Force Revision to SEMI P44-0211, Specification for Open Artwork System interchange Standard (OASIS®) Specific to Mask Tools


SNARF(s) Granted a One-Year Extension
None.

SNARF(s) Cancelled
None.

Standard(s) to receive Inactive Status
None.

Special Announcements of the Committee (Workshops, Programs, etc.)
None.

Next Meeting
SEMI Japan Standards Summer 2015 Meetings
Wednesday, June 25, 2015, 15:30-17:00, SEMI Japan, Ichigaya, Tokyo