SEMI International Standards
Standards Locale: North America |
Committee: Metrics |
Place of Meeting: SEMI HQ, Milpitas, CA |
Date of Meeting: 11/06/2019 |
Meeting End Date: 11/06/2019 |
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Recording SEMI Standards Staff: Inna Skvortsova |
CER Posted to Web: 11/15/2019 |
Leadership Changes
WG/TF/SC/TC Name | Previous Leader | New Leader |
RF Measurement Task Force | n/a | Supika Mashiro (TEL) |
Committee Structure Changes
Previous WG/TF/SC Name | New WG/TF/SC Name or Status Change |
Manufacturing Ownership Diversity (MOD) TF | Disbanded. |
Ballot Results
Document # | Document Title | Committee Action | A&R Forms for Approved Ballots |
R6472 | New Standard: Test Method for Measuring Surface Metal Contamination Through ICP-MS of Critical Chamber Components Used in Semiconductor Wafer Processing | Passed | |
6569 | Reapproval to SEMI E165-0813: Guide for a Comprehensive Equipment Training System When Dedicated Training Equipment is Not Available | Failed | |
6568 | Reapproval to SEMI E150-0314: Guide for Equipment Training Best Practices | Failed | |
6567 | Reapproval to SEMI E149-0314: Guide for Equipment Supplier-Provided Documentation for the Acquisition and Use of Manufacturing Equipment | Failed | |
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
# | Type | SC/TF/WG | Details |
6578 | SNARF | E-RAMP TF | Revision to SEMI E10-0814E: Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM) and Utilization
Approved by GCS 08/26/2019 |
6579 | SNARF | E-RAMP TF | Revision to SEMI E79-0814E: Specification for Definition and Measurement of Equipment Productivity
Approved by GCS 08/26/2019 |
Authorized Activities
# | Type | SC/TF/WG | Details |
6599 | SNARF | CCC TF | Line Item Revision to SEMI E1XX (The Standard to be published based on Doc. R6472): Test Method for Measuring Surface Metal Contamination Through ICP-MS of Critical Chamber Components Used in Semiconductor Wafer Processing. |
Authorized Ballots
# | When | TF | Details |
6578 | Cycle 1-2020 | E-RAMP TF | Revision to SEMI E10-0814E: Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM) and Utilization |
6579 | Cycle 1-2020 | E-RAMP TF | Revision to SEMI E79-0814E: Specification for Definition and Measurement of Equipment Productivity |
6599 | Cycle 1-2020 | CCC TF | Line Item Revision to SEMI E1XX (The Standard to be published based on Doc. R6472): Test Method for Measuring Surface Metal Contamination Through ICP-MS of Critical Chamber Components Used in Semiconductor Wafer Processing. |
SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
Standard Designation | Title |
SEMI E165-0813 | Guide for a Comprehensive Equipment Training System When Dedicated Training Equipment is not Available |
SEMI E150-0314 | Guide for Equipment Training Best Practices |
SEMI E149-0314 | Guide for Equipment Supplier-Provided Documentation for the Acquisition and Use of Manufacturing Equipment |
Special Announcements of the Committee (Workshops, Programs, etc.)
None.
Next Meeting
Next Meeting – Standards Spring 2020, SEMI HQ, CA
Tuesday, March 31, 2020
Wednesday, April 1, 2020
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