SEMI International Standards
Standards Locale: Japan
Committee: Micropatterning
Place of Meeting: SEMI Japan, Tokyo, Japan
Date of Meeting: 12/11/2012
Meeting End Date: 12/11/2012
Recording SEMI Standards Staff: Naoko Tejima
CER Posted to Web: 12/14/2012
Leadership Changes
None.
TC Chapter Structure Changes
None.
Ballot Results
Document # | Document Title | Committee Action | A&R Forms for Approved Ballots |
| 5483 | Reapproval of SEMI P47-0307, Test Method for Evaluation of Line-Edge Roughness and Linewidth Roughness | Passed as balloted |  5483_Ballot_Report.pdf |
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
None.
Authorized Activities
# | Type | SC/TF/WG | Details |
| 5537 | SNARF | 5-year-review Task Force | Line Item Revision to SEMI P23-0200 (Reapproved 1107), Guidelines for Programmed Defect Masks and Benchmark Procedures for Sensitivity Analysis of Mask Defect Inspection Systems |
| 5535 | SNARF | 5-year-review Task Force | Reapproval of SEMI P35-1106, Terminology for Microlithography Metrology |
| 5536 | SNARF | 5-year-review Task Force | Reapproval of SEMI P36-1108, Guide for Magnification Reference for Critical Dimension Measurement for Scanning Electron Microscopes (CD-SEMS)
(with Editorial Changes) |
Authorized Ballots
# | When | SC/TF/WG | Details |
| 5535 | C1-13 | 5-year-review Task Force | Reapproval of SEMI P35-1106, Terminology for Microlithography Metrology |
| 5536 | C1-13 | 5-year-review Task Force | Reapproval of SEMI P36-1108, Guide for Magnification Reference for Critical Dimension Measurement for Scanning Electron Microscopes (CD-SEMS)
(with Editorial Changes) |
SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
None.
Special Announcements of the Committee (Workshops, Programs, etc.)
None.
Next Meeting
SEMI Japan Standards Spring 2013 Meetings
Tuesday, April 9, 2013 15:30-17:30, SEMI Japan, Ichigaya, Tokyo
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