SEMI International Standards
Standards Locale: Japan |
Committee: Silicon Wafer |
Place of Meeting: SEMI Japan |
Date of Meeting: 06/16/2017 |
Meeting End Date: 06/16/2017 |
|
Recording SEMI Standards Staff: Junko Collins |
CER Posted to Web: 06/21/2017 |
Leadership Changes
None.
Committee Structure Changes
None.
Ballot Results
None.
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
None.
Authorized Activities
# | Type | SC/TF/WG | Details |
TBD | New SNARF | Test Method | SNARF for New Auxiliary Information: Round-Robin Testing of Sample Preparation Methods for Minority Carrier Diffusion Length Measurements by Surface Photovoltage Methods
*Need two weeks review for official approval |
5774 | Revised SNARF | Test Method | SNARF for Practice for Sample Preparation Method for Minority Carrier Diffusion Length Measurement in Silicon Wafers by Surface Photovoltage Method
*Need two weeks review for official approval |
Authorized Ballots
None.
SNARF(s) Granted a One-Year Extension
# | TF | Title | Expiration Date |
5769: | Test Method | New Standard: Test Method for Nitrogen Content in Silicon by Infrared Absorption | 2018/06/15 |
5770: | Test Method | New Standard: Test Method for Bulk Micro Defect Density and Denuded Zone Width in Annealed Silicon Wafers | 2018/06/15 |
5772: | Test Method | Revision of MF391-0310: Test Methods for Minority Carrier Diffusion Length in Extrinsic Semiconductors by Measurement of Steady-state Surface photovoltage | 2018/06/15 |
5774: | Test Method | Guide for Sample Preparation Method for Minority Carrier Diffusion Length Measurement in Silicon Wafers by Surface Photovoltage Method | 2018/06/15 |
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
None.
Special Announcements of the Committee (Workshops, Programs, etc.)
None.
Next Meeting
September 21, 2017
14:00-17:00
SEMI Japan Office, Tokyo, Japan
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