SEMI International Standards
Standards Locale: Japan
Committee: Silicon Wafer
Place of Meeting: SEMI Japan
Date of Meeting: 06/16/2017
Meeting End Date: 06/16/2017
Recording SEMI Standards Staff: Junko Collins
CER Posted to Web: 06/21/2017


Leadership Changes
None.

Committee Structure Changes
None.

Ballot Results
None.

Ratification Ballot Results
None.

Activities Approved by the GCS between meetings of TC Chapter meeting
None.

Authorized Activities


#
Type
SC/TF/WG
Details
TBDNew SNARFTest MethodSNARF for New Auxiliary Information: Round-Robin Testing of Sample Preparation Methods for Minority Carrier Diffusion Length Measurements by Surface Photovoltage Methods
*Need two weeks review for official approval
5774Revised SNARFTest MethodSNARF for Practice for Sample Preparation Method for Minority Carrier Diffusion Length Measurement in Silicon Wafers by Surface Photovoltage Method
*Need two weeks review for official approval



Authorized Ballots
None.

SNARF(s) Granted a One-Year Extension


#
TF
Title
Expiration Date
5769:Test MethodNew Standard: Test Method for Nitrogen Content in Silicon by Infrared Absorption2018/06/15
5770:Test MethodNew Standard: Test Method for Bulk Micro Defect Density and Denuded Zone Width in Annealed Silicon Wafers2018/06/15
5772:Test MethodRevision of MF391-0310: Test Methods for Minority Carrier Diffusion Length in Extrinsic Semiconductors by Measurement of Steady-state Surface photovoltage2018/06/15
5774:Test MethodGuide for Sample Preparation Method for Minority Carrier Diffusion Length Measurement in Silicon Wafers by Surface Photovoltage Method2018/06/15




SNARF(s) Cancelled
None.

Standard(s) to receive Inactive Status
None.

Special Announcements of the Committee (Workshops, Programs, etc.)
None.

Next Meeting
September 21, 2017
14:00-17:00
SEMI Japan Office, Tokyo, Japan