SEMI International Standards
Standards Locale: North America
Committee: Silicon Wafer
Place of Meeting: KLA-Tencor, Milpitas, CA
Date of Meeting: 04/10/2018
Meeting End Date: 04/10/2018
Recording SEMI Standards Staff: Kevin Nguyen
CER Posted to Web: 04/19/2018


Leadership Changes


WG/TF/SC/TC NamePrevious LeaderNew Leader
Int'l Polished Wafer Task ForceJohn Valley (Nanometrics)


Committee Structure Changes
None.

Ballot Results
None.

Ratification Ballot Results
None.

Activities Approved by the GCS between meetings of TC Chapter meeting
None.

Authorized Activities

#
Type
SC/TF/WG
Details
6362SNARFInt’l ASI TFLine Item Revision of SEMI M53-0216 Practice for Calibrating Scanning Surface Inspection Systems Using Certified Depositions of Monodispere Reference Spheres on Unpatterned Semiconductor Wafer Surfaces
    • Related Information 2: Expand with particle shape effect on LSE sizing; correct errors in published version
6363SNARFInt’l ASI TFRevision of SEMI M52-0214 Guide For Specifying Scanning Surface Inspection Systems For Silicon Wafers For The 130 Nm To 11 Nm Technology Generations
    • To include advanced node
6360SNARFInt’l PW TFReapproval of SEMI M74-1108 (Reapproved 0413) Specification for 450 mm Diameter Mechanical Handling Polished Wafers
6361SNARFInt’l AWG TFReapproval of SEMI MF1530-0707 (Reapproved 0512) Test Method for Measuring Flatness, Thickness, and Total Thickness Variation on Silicon Wafers by Automated Noncontact Scanning
6359SNARFInt’l Test Methods TFLine Item Revision off SEMI MF1527-0412 Guide For Application Of Certified Reference Materials And Reference Wafers For Calibration And Control Of Instruments For Measuring Resistivity Of Silicon
6355SNARFInt’l Test Methods TFReapproval of SEMI MF1049-0308 (Reapproved 0413) Practice for Shallow Etch Pit Detection on Silicon Wafers
6356SNARFInt’l Test Methods TFReapproval of SEMI MF1366-0308 (Reapproved 0413)Test Method for Measuring Oxygen Concentration in Heavily Doped Silicon Substrates by Secondary Ion Mass Spectrometry
6357SNARFInt’l Test Methods TFReapproval of SEMI MF1528-0413 Test Method for Measuring Boron Contamination in Heavily Doped N-Type Silicon Substrates by Secondary Ion Mass Spectrometry
6358SNARFInt’l Test Methods TFReapproval of SEMI MF672-0412 Guide for Measuring Resistivity Profiles Perpendicular to the Surface of a Silicon Wafer Using a Spreading Resistance Probe


Authorized Ballots

#
Type
SC/TF/WG
Details
6360Cycle 4-18Int’l PW TFReapproval of SEMI M74-1108 (Reapproved 0413) Specification for 450 mm Diameter Mechanical Handling Polished Wafers
6361Cycle 4-18Int’l AWG TFReapproval of SEMI MF1530-0707 (Reapproved 0512) Test Method for Measuring Flatness, Thickness, and Total Thickness Variation on Silicon Wafers by Automated Noncontact Scanning
6359Cycle 4-18Int’l Test Methods TFLine Item Revision off SEMI MF1527-0412 Guide For Application Of Certified Reference Materials And Reference Wafers For Calibration And Control Of Instruments For Measuring Resistivity Of Silicon
6355Cycle 4-18Int’l Test Methods TFReapproval of SEMI MF1049-0308 (Reapproved 0413) Practice for Shallow Etch Pit Detection on Silicon Wafers
6356Cycle 4-18Int’l Test Methods TFReapproval of SEMI MF1366-0308 (Reapproved 0413)Test Method for Measuring Oxygen Concentration in Heavily Doped Silicon Substrates by Secondary Ion Mass Spectrometry
6357Cycle 4-18Int’l Test Methods TFReapproval of SEMI MF1528-0413 Test Method for Measuring Boron Contamination in Heavily Doped N-Type Silicon Substrates by Secondary Ion Mass Spectrometry
6358Cycle 4-18Int’l Test Methods TFReapproval of SEMI MF672-0412 Guide for Measuring Resistivity Profiles Perpendicular to the Surface of a Silicon Wafer Using a Spreading Resistance Probe


SNARF(s) Granted a One-Year Extension
None.

SNARF(s) Cancelled
None.

Standard(s) to receive Inactive Status
None.

Special Announcements of the Committee (Workshops, Programs, etc.)
None.

Next Meeting
July 10, 2018 1:30 pm - 5:30 pm San Francisco Marriott Marquis, San Francisco, California in conjunction with SEMICON West. Please refer to www.semi.org/standards, under calendar of event for additional information.