SEMI International Standards
Standards Locale: Japan
Committee: Silicon Wafer
Place of Meeting: SEMI Japan, Tokyo, Japan
Date of Meeting: 03/06/2014
Meeting End Date: 03/06/2014
Recording SEMI Standards Staff: Naoko Tejima
CER Posted to Web: 03/11/2014


Leadership Changes

Group
Previous Leader
New Leader
International Epitaxial Wafers Task ForceTakao Takenaka (Consultant)TBD


Committee Structure Changes
None.

Ballot Results
None.

Ratification Ballot Results
None.

Activities Approved by the GCS between meetings of TC Chapter meeting
None.

Authorized Activities

#
Type
SC/TF/WG
Details
4844Revised
SNARF		Test Methods Task ForceGuide for the Measurement of Trace Metal Contamination on Silicon Wafer Surface by Inductively Coupled Plasma Mass Spectrometry


Authorized Ballots

#
When
SC/TF/WG
Details
4844CCycle 3Test Methods Task ForceGuide for the Measurement of Trace Metal Contamination on Silicon Wafer Surface by Inductively Coupled Plasma Mass Spectrometry


SNARF(s) Granted a One-Year Extension
None.

SNARF(s) Cancelled
None.

Standard(s) to receive Inactive Status
None.

Special Announcements of the Committee (Workshops, Programs, etc.)
None.

Next Meeting
SEMI Japan Standards Summer 2014 Meetings
Thursday, June 12, 2014, 13:30-17:30, SEMI Japan, Tokyo, Japan