SEMI International Standards
Standards Locale: Japan |
Committee: Silicon Wafer |
Place of Meeting: Tokyo Big Sight, Tokyo, Japan |
Date of Meeting: 12/03/2014 |
Meeting End Date: 12/03/2014 |
|
Recording SEMI Standards Staff: Naoko Tejima |
CER Posted to Web: 12/16/2014 |
Leadership Changes
None.
Committee Structure Changes
None.
Ballot Results
Document # | Document Title | Committee Action | A&R Forms for Approved Ballots |
5736 | Line Item Revision to M41-1213 Specification of Silicon-on-Insulator (SOI) for Power Device/ICs | Passed with editorial changes | Ballot_Review_for_5736.pdf |
5742 | Line Item Revision to M62-0514, Specifications for Silicon Epitaxial Wafers | Passed | Ballot_Review_for_5742.pdf |
5743 | Line Item Revision to SEMI M1-1014, Specifications for Polished Single Crystal Silicon Wafers | Passed with editorial changes | Ballot_Review_for_5743_3.pdf |
5771 | Revision to SEMI M80-0514, Mechanical Specification for Front-Opening Shipping Box used to Transport and Ship 450 mm Wafers with Title Change to Specification for Front-Opening Shipping Box used to Transport and Ship 450mm Wafer | Failed | Ballot_Review_for_5771.pdf |
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
None.
Authorized Activities
# | Type | SC/TF/WG | Details |
-- | SNARF
(Tentatively) | JA Test Method Task Force | Line Item Revision to SEMI Standard M085-1014: Guide for the Measurement of Trace Metal Contamination on Silicon Wafer Surface by Inductively Coupled Plasma Mass Spectrometry |
5737 | Revised SNARF | JA Test Method Task Force | Revision of SEMI MF1391-1107, Test Method for Substitutional Atomic Carbon Content of Silicon by Infrared Absorption |
Authorized Ballots
# | When | SC/TF/WG | Details |
5794 | Cycle 3/4 | International 450mm Wafers TF | New Standard: Specification Of Developmental 450mm Diameter Polished Single Crystal Notchless Silicon Wafers With Back Surface Fiducial Marks |
5655 | Cycle 3/4 | International Polished Wafers TF | Line Item Revision of SEMI M1-1013, Specifications for Polished Single Crystal Silicon Wafers, to update 450 mm wafers edge exclusion |
5807 | Cycle 2/3 | International Advanced Wafer Geometry TF | Revision for M77 -1110, with title change from “Practice for Determining Wafer Near-Edge Geometry Using Roll-Off Amount, ROA” to “Test Method for Determining Wafer Near-Edge Geometry Using Roll-Off Amount, ROA” |
5746 | Cycle 1/2 | International Automated Advanced Surface Inspection TF | Line Item Revision of SEMI ME1392-1109, Guide for Angle Resolved Optical Scatter Measurements on Specular or Diffuse Surfaces |
SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
None.
Special Announcements of the Committee (Workshops, Programs, etc.)
None.
Next Meeting
SEMI Japan Standards Spring 2015 Meetings
Friday, March 6, 2015, 13:30-17:30, SEMI Japan, Tokyo, Japan
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