SEMI International Standards
| Standards Locale: North America |
| Committee: Microlithography |
| Place of Meeting: San Francisco Marriott Marquis Hotel in San Francisco, California |
| Date of Meeting: 07/14/2015 |
| Meeting End Date: 07/14/2015 |
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| Recording SEMI Standards Staff: Paul Trio |
| CER Posted to Web: 07/22/2015 |
Leadership Changes
Group | Previous Leader | New Leader |
| NA Microlithography TC Chapter | Rick Silver (NIST) stepped down as TC Chapter cochair. | Bryan Barnes (NIST) was appointed as TC Chapter cochair serving with Wes Erck (Wes Erck & Associates) |
| Standards for Scatterometry Task Force has been disbanded. | | |
Committee Structure Changes
None.
Ballot Results
None.
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
None.
Authorized Activities
# | Type | SC/TF/WG | Details |
TBA | SNARF | Extreme Ultraviolet (EUV) Mask TF | Line Item Revision to SEMI P5-0704, Specification for Pellicles to include material for EUV pellicle. |
TBA | SNARF | NA Microlithography (5-Year Review) | Reapproval for SEMI P40, Specification for Mounting Requirements for Extreme Ultraviolet Lithography Masks |
TBA | SNARF | NA Microlithography (5-Year Review) | Reapproval for SEMI P48, Specification of Fiducial Marks for EUV Mask Blank |
TBA | SNARF | Data Path TF | Line Item Revision to SEMI P39, OASISTM - Open Artwork System Interchange Standard to correct nonconforming title |
TBA = to be assigned
Note: SNARFs and TFOFs are available for review on the SEMI Web site at:
http://downloads.semi.org/web/wstdsbal.nsf/TFOFSNARF
Authorized Ballots
# | When | SC/TF/WG | Details |
TBA | Cycle 7, 8, or 9-2015 | Extreme Ultraviolet (EUV) Mask TF | Line Item Revision to SEMI P5-0704, Specification for Pellicles to include material for EUV pellicle. |
TBA | Cycle 7, 8, or 9-2015 | NA Microlithography (5-Year Review) | Reapproval for SEMI P40, Specification for Mounting Requirements for Extreme Ultraviolet Lithography Masks |
TBA | Cycle 7, 8, or 9-2015 | NA Microlithography (5-Year Review) | Reapproval for SEMI P48, Specification of Fiducial Marks for EUV Mask Blank |
TBA | Cycle 7, 8, or 9-2015 | Data Path TF | Line Item Revision to SEMI P39, OASISTM - Open Artwork System Interchange Standard to correct nonconforming title |
TBA = to be assigned
SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
None.
Special Announcements of the Committee (Workshops, Programs, etc.)
Feedback Requested on NA Microlithography TC Chapter-Originated Standards to go into Inactive Status
At the North America (NA) Microlithography Technical Committee (TC) Chapter meeting held July 14, in conjunction with SEMICON West 2015, the committee agreed to move the following Standards into Inactive status. However, before doing so, the TC Chapter is soliciting inputs on alternate courses of action for these Documents. If no inputs are received, these Standards will go into Inactive status.
Note: Per section 4.2.19 of the SEMI Standards Regulations, Inactive Status is used to describe a Standard or Safety Guideline that is not currently supported by the global technical committee. Inactive Standards and Inactive Safety Guidelines are still available from SEMI. Inactive Standards and Inactive Safety Guidelines contain an ‘Inactive’ watermark, but will still be available in the ‘Current Standards’ section of the SEMI Web site.
- P1-0708E, Specification for Hard Surface Photomask Substrates
- P2-0308, Specification for Chrome Thin Films for Hard Surface Photomasks
- P3-0308, Specification for Photoresist/E-Beam Resist for Hard Surface Photoplates
- P6-88 (Reapproved 0707), Specification for Registration Marks for Photomasks
- P12-0997, Determination of Iron, Zinc, Calcium, Magnesium, Copper, Boron, Aluminum, Chromium, Manganese, and Nickel in Positive Photoresists by Inductively Coupled Plasma Emission Spectroscopy (ICP)
- P13-91 (Reapproved 1104), Determination of Sodium and Potassium in Positive Photoresists by Atomic Absorption Spectroscopy
- P14-0997, Determination of Tin in Positive Photoresists by Graphite Furnace Atomic Absorption Spectroscopy
- P15-92 (Reapproved 1104), Determination of Sodium and Potassium in Positive Photoresist Metal Ion Free (MIF) Developers by Atomic Absorption Spectroscopy
- P16-92 (Reapproved 1104), Determination of Tin in Positive Photoresist Metal Ion Free (MIF) Developers by Graphite Furnace Atomic Absorption Spectroscopy
- P17-92 (Reapproved 0299), Determination of Iron, Zinc, Calcium, Magnesium, Copper, Boron, Aluminum, Chromium, Manganese, and Nickel in Positive Photoresist Metal Ion Free (MIF) Developers by Inductively Coupled Plasma Emission Spectroscopy (ICP)
- P18-92 (Reapproved 1104), Specification for Overlay Capabilities of Wafer Steppers
- P19-92 (Reapproved 0707), Specification for Metrology Pattern Cells for Integrated Circuit Manufacture
- P24-94 (Reapproved 1104), CD Metrology Procedures
- P28-96 (Reapproved 0707), Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture
- P34-0200 (Reapproved 0707), Specification for 230 mm Square Photomask Substrates
- P45-0211, Specification for Job Deck Data Format for Mask Tools
SEMI P10 to Inactive Status
At the North America (NA) Standards Meetings at SEMICON West 2015, the NA Microlithography Technical Committee Chapter agreed to allow SEMI P10 (Specification of Data Structures for Photomask Orders) to go into Inactive Status.
NA Microlithography TC Chapter SNARFs Discontinued
At the North America (NA) Microlithography Committee meeting held July 14, in conjunction with SEMICON West 2015, the following activities were discontinued:
- Revision of SEMI P10-1112, Specification of Data Structures for Photomask Orders (SNARF # 5561)
> No additional document development activity planned.
- Reapproval of SEMI P35-1106, Terminology for Microlithography Metrology (SNARF # 5145)
> SEMI P35 was reapproved via the Japan Micropatterning TC Chapter in spring 2013.
- Revision to SEMI P25-94 (Reapproved 1104), Specification for Measuring Depth of Focus and Best Focus (SNARF # 5271)
> SEMI P25 has already been moved into Inactive status.
Next Meeting
In conjunction with the SPIE Advanced Lithography Conference
February 21-25, 2016
San Jose Marriott and San Jose Convention Center
San Jose, California
U.S.A.
Wednesday, February 24
- Microlithography Committee (6:00 PM to 8:00 PM)
For more information, please visit: http://www.spie.org/x10942.xml
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