SEMI International Standards
Standards Locale: North America
Committee: Metrics
Place of Meeting: Moscone Center, SF
Date of Meeting: 07/12/2023
Meeting End Date: 07/12/2023
Recording SEMI Standards Staff: Michelle Sun
CER Posted to Web: 07/26/2023


Leadership Changes
None.

Committee Structure Changes

Previous WG/TF/SC Name
New WG/TF/SC Name or Status Change
License Server Certification Task Force [disbanded]None


Ballot Results

Document #
Document Title
TC Chapter Action
A&R Forms for Approved Ballots
6838Reapproval of SEMI E114-0302E (Reapproved 0616), Test Method for RF Cable Assemblies Used in Semiconductor Processing Equipment RF Power Delivery SystemsPassedAR - 6838.pdfAR - 6838.pdf
6839Reapproval of SEMI E115-0302E (Reapproved 0816), Test Method for Determining the Load Impedance and Efficiency of Matching Networks Used in Semiconductor Processing Equipment RF Power Delivery SystemsPassedAR - 6839.pdfAR - 6839.pdf
7056Reapproval of SEMI E168-0915, Specification for Product Time MeasurementPassedAR - 7056.pdfAR - 7056.pdf
7057Reapproval of SEMI E168.1-1114, Specification for Product Time Measurement in GEM 300 Production EquipmentPassedAR - 7057.pdfAR - 7057.pdf
7058Reapproval of SEMI E168.2-0915, Specification for Product Time Measurement for Material Control SystemsPassedAR - 7058.pdfAR - 7058.pdf
7059Reapproval of SEMI E168.3-0915, Specification for Product Time Measurement for TransportPassedAR - 7059.pdfAR - 7059.pdf
Note 1: Passed ballots and line items will be submitted to the ISC Audit & Review Subcommittee for procedural review.

Note 2: Failed ballots and line items were returned to the originating task forces for re-work and re-balloting or abandoning.



Ratification Ballot Results
None.

Activities Approved by the GCS between meetings of TC Chapter meeting
None.

Authorized Activities

#
Type
SC/TF/WG
Details
7129SNARFCCC TFNew Standard: Test Method for Measuring Particles and Contamination by A Liquid Particle Counter of Critical Chamber Components Used in Semiconductor Wafer Processing and Inspection
7130SNARFCCC TFNew Standard: Test Method for Measuring Surface Contamination by Particle Concentration Through Replacement Substrate and Optical Metrology of Critical Chamber Components Used in Semiconductor Wafer Processing and Inspection


Authorized Ballots

#
When
TF
Details
7131Cycle 7-2023RF MeasurementsReapproval of SEMI E135-0918, Test Method for RF Generators to Determine Transient Response for RF Power Delivery Systems Used in Semiconductor Processing Equipment
7132Cycle 7-2023RF MeasurementsReapproval of SEMI E143-0306 (Reapproved 0518), Test Method for Measuring Power and Variation into a 50-Ω Load and Power Variation and Spectrum into a Load with a VSWR of 2.0 at any phase Angle
6931Cycle 7-2023CCC TFNew Standard: Test Method for Measuring Organics Contamination Through Thermal Desorption or Solvent Extraction Gas Chromatography Mass Spectrometry of Critical Chamber Components Used in Semiconductor Wafer Processing and Inspection
7129Cycle 7-2023CCC TFNew Standard: Test Method for Measuring Particles and Contamination by A Liquid Particle Counter of Critical Chamber Components Used in Semiconductor Wafer Processing and Inspection
7130Cycle 7-2023CCC TFNew Standard: Test Method for Measuring Surface Contamination by Particle Concentration Through Replacement Substrate and Optical Metrology of Critical Chamber Components Used in Semiconductor Wafer Processing and Inspection


SNARF(s) Granted a One-Year Extension
None.

SNARF(s) Abolished
None.

Standard(s) to receive Inactive Status

Standard Designation
Title
SEMI E163-0212Guide for the Handling of Reticles and Other Extremely Electrostatic Sensitive (EES) Items Within Specially Designated Areas


Special Announcements of the Committee (Workshops, Programs, etc.)
None.

Next Meeting

The next meeting is scheduled for Thursday, November 9, 2023, 1:30–5:30 PM (Pacific Time). See http://www.semi.org/standards-events for the current list of events.