SEMI International Standards
| Standards Locale: North America |
| Committee: Metrics |
| Place of Meeting: Milpitas/CA |
| Date of Meeting: 03/28/2024 |
| Meeting End Date: |
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| Recording SEMI Standards Staff: Michelle Sun |
| CER Posted to Web: 04/05/2024 |
Leadership Changes
None.
Committee Structure Changes
None.
Ballot Results
Document # | Document Title | TC Chapter Action | A&R Forms for Approved Ballots |
| 7129A | New Standard: Test Method for Measuring Particles and Contamination by A Liquid Particle Counter of Critical Chamber Components Used in Semiconductor Wafer Processing and Inspection | Failed | |
| 7130A | New Standard: Test Method for Measuring Surface Contamination by Particle Concentration Through Replacement Substrate and Optical Metrology of Critical Chamber Components Used in Semiconductor Wafer Processing and Inspection | Failed | |
| 6894 | Line Item Revision to E33-0217E, Guide for Semiconductor Manufacturing Equipment Electromagnetic Compatibility (EMC) and E176-1017, Guide to Assess and Minimize Electromagnetic Interference (EMI) in a Semiconductor Manufacturing Environment | |  AR - 6894.pdf |
| LI-1 | Move Appendix 1 from SEMI E33 to E176 | Failed | |
| LI-2 | Update References and Other Editorial Changes | Passed with editorial changes | |
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
# | Type | SC/TF/WG | Details |
| Liaison | EMC TF | Approval of Gregory Larson (Intel) to be the official representative of SEMI, who makes technical contributions to and participates actively in the work of IEC TC 77 / Working Group 13 |
| 6894 | Ballot Authorization | EMC TF | Line Item Revision to E33-0217E, Guide for Semiconductor Manufacturing Equipment Electromagnetic Compatibility (EMC) and E176-1017, Guide to Assess and Minimize Electromagnetic Interference (EMI) in a Semiconductor Manufacturing Environment |
Authorized Activities
None.
Authorized Ballots
# | When | TF | Details |
| 7129B | Cycle 4 or 5-2024 | CCC TF | New Standard: Test Method for Measuring Particles and Contamination by A Liquid Particle Counter of Critical Chamber Components Used in Semiconductor Wafer Processing and Inspection |
| 7130B | Cycle 4 or 5-2024 | CCC TF | New Standard: Test Method for Measuring Surface Contamination by Particle Concentration Through Replacement Substrate and Optical Metrology of Critical Chamber Components Used in Semiconductor Wafer Processing and Inspection |
SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
None.
Special Announcements of the Committee (Workshops, Programs, etc.)
None.
Next Meeting
The next meeting is tentatively scheduled for Tuesday, July 9, 2024, at SEMICON West. See http://www.semi.org/standards-events for the current list of events.
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