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Standards Locale: North America

Committee: Liquid Chemicals

Place of Meeting: SEMI HQ, Milpitas, CA

Date of Meeting: 11/05/2019

Meeting End Date: 11/05/2019

Recording SEMI Standards Staff: Inna Skvortsova

CER Posted to Web: 11/15/2019

Document #	Document Title	Committee Action	A&R Forms for Approved Ballots
6195A	Revision to SEMI F104-0312: Particle Test Method for Evaluation of Components Used in UPW and Liquid Chemicals Distribution Systems, with title change.	Passed with editorial change(s)	6195A_Ballot Review.pdf
6433	New Standard: Test Method for Determining Conductivity of Chemical Mechanical Polish (CMP) Slurries and Related Chemicals	Passed	6433_Ballot Review.pdf
6559	Reapproval to SEMI C18-0714: Specification for Acetic Acid	Passed	6559_Ballot Review.pdf
6560	Reapproval to SEMI C23-0714: Specifications for Buffered Oxide Etchants	Passed	6560_Ballot Review.pdf
6490	Revision to SEMI C93- 0217: Guide for Determining the Quality of Ion Exchange Resin Used in Polish Applications of Ultrapure Water System	Passed	6490_Ballot Review.pdf

Ratification Ballot Results
None.

Activities Approved by the GCS between meetings of TC Chapter meeting
None.

Authorized Activities

#	Type	SC/TF/WG	Details
6600	SNARF	WM TF	New Standard: Guide for Semiconductor Tool Water Reuse New SNARF distributed for 2-week member review and approved at TC meeting
6603	SNARF	WM TF	Revision to SEMI F98-0618: Guide for Water Reuse in Semiconductor Industry New SNARF distributed for 2-week member review and approved at TC meeting
6601	SNARF	HPPM&C TF	New Standard: Guide to Meet IRDS Yield Table Recommendations for High Purity Polymer Materials and Components Used in Ultrapure Water and Liquid Chemical Distribution Systems New SNARF distributed for 2-week member review and approved at TC meeting
6602	SNARF	CAM TF	New Standard: Test Method for Determining pH of Chemical Mechanical Planarization (CMP) Slurries and Related Chemicals New SNARF distributed for 2-week member review and approved at TC meeting
6489	SNARF	CMP-C TF	New Standard: Guide for Reporting Chemical Mechanical Planarization (CMP) Polishing Pad Hardness used in Semiconductor Manufacturing Revision of SNARF to change Task Force from HPPMC to newly formed CMP-C approved at TC.
6606	SNARF	CAM TF	Reapproval to SEMI C69-1015: Test Method for the Determination of Surface Areas of Polymer Pellets New SNARF approved at TC

Authorized Ballots

#	When	TF	Details
6561	Cycle 1 or 2-2020	HPPM&C TF	Line Item Revision to SEMI F40-0699E (Reapproved 0918): Practice for Preparing Liquid Chemical Distribution Components for Chemical Testing
6575	Cycle 1 or 2-2020	UPW TF	Line Item Revision to SEMI F61-0617: Guide to Design and Operation of a Semiconductor Ultrapure Water System
6576	Cycle 1 or 2-2020	UPW TF	Line Item Revision to SEMI F63-0918: Guide for Ultrapure Water Used in Semiconductor Processing
6577	Cycle 1 or 2-2020	UPW TF	Line Item Revision to SEMI F75-0617: Guide for Quality Monitoring of Ultrapure Water Used in Semiconductor Manufacturing
6606	Cycle 1 or 2-2020	CAM TF	Reapproval to SEMI C69-1015: Test Method for the Determination of Surface Areas of Polymer Pellets

SNARF(s) Granted a One-Year Extension
None.

SNARF(s) Cancelled
None.

Standard(s) to receive Inactive Status

Standard Designation	Title
SEMI C53-0704 (Reapproved 0312)	Specifications for Dimethyl Sulfoxide (DMSO) [Grades 1 and 2]
SEMI C86-0415	Guide for Ethylene Glycol

Special Announcements of the Committee (Workshops, Programs, etc.)
None.

Next Meeting

Next Meeting - Standards Spring 2020 Meetings <tentative schedule>

Monday, March 30, 2020; SEMI HQ, Milpitas CA

· NA Liquid Chemicals Leadership Meeting (1:00PM-2:00PM)

· Chemical Analytical Methods TF (2:00PM-3:00PM)

· New CMP-C TF (3:30PM-4:30PM)

· Water Conservation Task Force (4:30PM – 5:30PM)

· High Purity Polymer Materials & Components (8:30AM – 9:30AM)

· Ultrapure Water TF (9:30AM – 10:30AM)

· Liquid Chemicals TC Chapter (2:00PM – 5:00PM)