SEMI International Standards
Standards Locale: North America
Committee: MEMS / NEMS
Place of Meeting: Moscone Center, San Francisco, California/USA
Date of Meeting: 07/10/2019
Meeting End Date: 07/10/2019
Recording SEMI Standards Staff: Laura Nguyen
CER Posted to Web: 07/18/2019


Leadership Changes
None.

Committee Structure Changes
None.

Ballot Results
None.

Ratification Ballot Results
None.

Activities Approved by the GCS between meetings of TC Chapter meeting
None.

Authorized Activities
None.

Authorized Ballots
Listing of documents authorized by the Originating TC Chapter for Letter Ballot.
#
When
TF
Details
6007Cycle 7-2019MEMS Material Characterization TFNew Standard: Guide for Use of Test Patterns for Characterizing a Deep Reactive Ion Etching (DRIE) Process
6018Cycle 7-2019MEMS Substrate TFNew Standard: Specification for Silicon Substrates used in fabrication of MEMS Devices


SNARF(s) Granted a One-Year Extension
None.

SNARF(s) Cancelled
None.

Standard(s) to receive Inactive Status
None.

Special Announcements of the Committee (Workshops, Programs, etc.)
Members of the SEMI MSIG WGs meet also with the MEMS Standards meetings. Please contact Soomin Chung (schung@semi.org) for more information about the SEMI MSIG WGs.

Next Meeting

The next meeting is scheduled in conjunction with the NA Standards Fall 2019 Meetings at SEMI Headquarters in Milpitas, California happening November 4-7, 2019. Exact dates are TBD. For more information, please visit the Standards Calendar at http://www.semi.org/standards.


Tentative Schedule:

            TBD Microfluidics (TF)
            TBD Joint MSIG, MEMS Substrate, and Material Characterization (TFs)
            TBD MEMS / NEMS (C)