SEMI International Standards
Standards Locale: North America |
Committee: MEMS / NEMS |
Place of Meeting: Moscone Center, San Francisco, California/USA |
Date of Meeting: 07/10/2019 |
Meeting End Date: 07/10/2019 |
|
Recording SEMI Standards Staff: Laura Nguyen |
CER Posted to Web: 07/18/2019 |
Leadership Changes
None.
Committee Structure Changes
None.
Ballot Results
None.
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
None.
Authorized Activities
None.
Authorized Ballots
Listing of documents authorized by the Originating TC Chapter for Letter Ballot.
# | When | TF | Details |
6007 | Cycle 7-2019 | MEMS Material Characterization TF | New Standard: Guide for Use of Test Patterns for Characterizing a Deep Reactive Ion Etching (DRIE) Process |
6018 | Cycle 7-2019 | MEMS Substrate TF | New Standard: Specification for Silicon Substrates used in fabrication of MEMS Devices |
SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
None.
Special Announcements of the Committee (Workshops, Programs, etc.)
Members of the SEMI MSIG WGs meet also with the MEMS Standards meetings. Please contact Soomin Chung (schung@semi.org) for more information about the SEMI MSIG WGs.
Next Meeting
The next meeting is scheduled in conjunction with the NA Standards Fall 2019 Meetings at SEMI Headquarters in Milpitas, California happening November 4-7, 2019. Exact dates are TBD. For more information, please visit the Standards Calendar at http://www.semi.org/standards.
Tentative Schedule:
TBD Microfluidics (TF)
TBD Joint MSIG, MEMS Substrate, and Material Characterization (TFs)
TBD MEMS / NEMS (C)
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