SEMI International Standards
Standards Locale: Japan |
Committee: Silicon Wafer |
Place of Meeting: Tokyo Big Sight |
Date of Meeting: 12/12/2019 |
Meeting End Date: 12/12/2019 |
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Recording SEMI Standards Staff: Junko Collins |
CER Posted to Web: 12/23/2019 |
Leadership Changes
Committee Structure Changes
None.
Ballot Results
Document # | Document Title | Committee Action | A&R Forms for Approved Ballots |
6168 | Line Item Revision to SEMI M67-1015: TEST METHOD FORDETREMINING WAFER NEAR-EDGE GEOMETRY FROM AMEASURED THICKNESS DATA ARRAY USING THE ESFQR, ESFQDAND ESBIR METRICS, to add exclusion windows to prevent distorted area data | | |
Line Item 1 | Adding exclusion windows to determine valid sector for ESFQR ESFQD and ESBIRD | Passed as balloted | #6168 Ballot Report(LI)_R0.1.pdf |
6505 | Line Item Revision to SEMI M68-1015: TEST METHOD FOR DETERMINING WAFER NEAR-EDGE GEOMETRY FROM A MEASURED HIGHT DATA ARRAY USING A CURVATURE METRICS, ZDD to add exclusion windows to prevent distorted area data | | |
Line Item 1 | Adding exclusion windows to determine valid sector for ZDD | Passed as balloted | #6505 Ballot Report(LI)_R0.1.pdf |
6526A | NEW STANDARD: TEST METHOD FOR BULK MICRO DEFECT DENSITY AND DENUDED ZONE WIDTH IN ANNEALED SILICON WAFERS BY OPTICAL MICROSCOPY AFTER PREFERENTIAL ETCHING | Failed | |
Note 1: Passed ballots and line items will be submitted to the ISC Audit & Review Subcommittee for procedural review.
Note 2: Failed ballots and line items were returned to the originating task forces for re-work and re-balloting or abandoning.
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
None.
Authorized Activities
None.
Authorized Ballots
Listing of documents authorized by the Originating TC Chapter for Letter Ballot.
# | When | TF | Details |
5981 | C2-2020 | Int’l Test Method | New Standard: Test Method for Recombination Lifetime of the Epilayer of the Silicon Epitaxial Wafer (p/p+, n/n+) by the Short Wavelength excitation Microwave Photoconductive Decay Method |
6526B | C2-2020 | Int’l Test Method | New Standard: Test Method for Bulk Micro Defect Density and Denuded Zone Width in Annealed Silicon Wafers by Optical Microscopy After Preferential Etching |
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SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
None.
Special Announcements of the Committee (Workshops, Programs, etc.)
None.
Next Meeting
Next Meeting
April 15, Wednesday, 14:00-17:00, SEMI Japan Office, Japan Spring Meeting
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