CER - North America Metrics Committee Meeting held on 11/09/2023

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SEMI International Standards

Standards Locale: North America

Committee: Metrics

Place of Meeting: SEMI HQ/Milpitas

Date of Meeting: 11/09/2023

Meeting End Date:

Recording SEMI Standards Staff: Michelle Sun

CER Posted to Web: 11/22/2023

Leadership Changes
None.

Committee Structure Changes
None.

Ballot Results

Document #	Document Title	TC Chapter Action	A&R Forms for Approved Ballots
6931	New Standard: Test Method for Measuring Organics Contamination Through Thermal Desorption or Solvent Extraction Gas Chromatography Mass Spectrometry of Critical Chamber Components Used in Semiconductor Wafer Processing and Inspection	Failed
7129	New Standard: Test Method for Measuring Particles and Contamination by A Liquid Particle Counter of Critical Chamber Components Used in Semiconductor Wafer Processing and Inspection	Failed
7130	New Standard: Test Method for Measuring Surface Contamination by Particle Concentration Through Replacement Substrate and Optical Metrology of Critical Chamber Components Used in Semiconductor Wafer Processing and Inspection	Failed
7131	Reapproval of SEMI E135-0918, Test Method for RF Generators to Determine Transient Response for RF Power Delivery Systems Used in Semiconductor Processing Equipment	Passed with editorial changes	AR - 7131.pdf
7132	Reapproval of SEMI E143-0306 (Reapproved 0518), Test Method for Measuring Power and Variation into a 50-Ω Load and Power Variation and Spectrum into a Load with a VSWR of 2.0 at any phase Angle	Passed with editorial changes	AR - 7132.pdf

Ratification Ballot Results
None.

Activities Approved by the GCS between meetings of TC Chapter meeting
None.

Authorized Activities

#	Type	SC/TF/WG	Details
7167	SNARF	CCC TF	New Standard: Test Method for Measuring and Characterizing Surface Particle Contamination on Critical Chamber Components with Airborne Particle Counter and Dry Aerosolizing Chamber

Authorized Ballots

#	When	TF	Details
6931A	Cycle 1-2024 or later	CCC TF	New Standard: Test Method for Measuring Organics Contamination Through Thermal Desorption or Solvent Extraction Gas Chromatography Mass Spectrometry of Critical Chamber Components Used in Semiconductor Wafer Processing and Inspection
7129A	Cycle 1-2024 or later	CCC TF	New Standard: Test Method for Measuring Particles and Contamination by A Liquid Particle Counter of Critical Chamber Components Used in Semiconductor Wafer Processing and Inspection
7130A	Cycle 1-2024 or later	CCC TF	New Standard: Test Method for Measuring Surface Contamination by Particle Concentration Through Replacement Substrate and Optical Metrology of Critical Chamber Components Used in Semiconductor Wafer Processing and Inspection
7235	Cycle 1-2024 or later	Metrics Committee	Reapproval of SEMI E43-0813 (Reapproved 1019), Guide for Electrostatic Measurements on Objects and Surfaces

SNARF(s) Granted a One-Year Extension
None.

SNARF(s) Cancelled
None.

Standard(s) to receive Inactive Status
None.

Special Announcements of the Committee (Workshops, Programs, etc.)
None.

Next Meeting
The next meeting is tentatively scheduled for Thursday, March 28, 2024, at SEMI HQ, Milpitas. See http://www.semi.org/standards-events for the current list of events.

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