SEMI International Standards
Standards Locale: Japan
Committee: Silicon Wafer
Place of Meeting: Tokyo, Japan
Date of Meeting: 08/02/2019
Meeting End Date: 08/02/2019
Recording SEMI Standards Staff: Junko Collins
CER Posted to Web: 09/12/2019


Leadership Changes

Table 1
WG/TF/SC/TC Name
Previous Leader
New Leader
Japan AWG Task ForceSatoshi Akiyama, OptimaNone
Committee Structure Changes

Previous WG/TF/SC Name
New WG/TF/SC Name or Status Change
Japan AWG Task ForceDisbanded
Ballot Results
None.

Ratification Ballot Results
None.

Activities Approved by the GCS between meetings of TC Chapter meeting
None.

Authorized Activities
None.

Authorized Ballots

Table 1

Listing of documents authorized by the Originating TC Chapter for Letter Ballot.
#
When
TF
Details
6526AC7, 2019Test MethodNew Standard Document: Test Method for Bulk Microdefect density and Denuded Zone Width in Annealed Silicon Wafers by Optical Microscopy after Preferential Etching
SNARF(s) Granted a One-Year Extension
None.

SNARF(s) Cancelled
None.

Standard(s) to receive Inactive Status
None.

Special Announcements of the Committee (Workshops, Programs, etc.)
None.

Next Meeting
December 12, Thursday, 13:00-17:00 (TBD), Tokyo Big Sight, SEMICON Japan 2019

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