SEMI International Standards
Standards Locale: Japan |
Committee: Silicon Wafer |
Place of Meeting: Tokyo, Japan |
Date of Meeting: 08/02/2019 |
Meeting End Date: 08/02/2019 |
|
Recording SEMI Standards Staff: Junko Collins |
CER Posted to Web: 09/12/2019 |
Leadership Changes
Table 1
Committee Structure Changes
Ballot Results
None.
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
None.
Authorized Activities
None.
Authorized Ballots
Table 1
Listing of documents authorized by the Originating TC Chapter for Letter Ballot.
# | When | TF | Details |
6526A | C7, 2019 | Test Method | New Standard Document: Test Method for Bulk Microdefect density and Denuded Zone Width in Annealed Silicon Wafers by Optical Microscopy after Preferential Etching |
| | | |
SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
None.
Special Announcements of the Committee (Workshops, Programs, etc.)
None.
Next Meeting
December 12, Thursday, 13:00-17:00 (TBD), Tokyo Big Sight, SEMICON Japan 2019
.
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