SEMI International Standards
Standards Locale: North America |
Committee: Micropatterning |
Place of Meeting: Moscone South Hall - San Francisco, CA |
Date of Meeting: 07/10/2019 |
Meeting End Date: 07/10/2019 |
|
Recording SEMI Standards Staff: Kevin Nguyen |
CER Posted to Web: 07/17/2019 |
Leadership Changes
None.
Committee Structure Changes
None.
Ballot Results
None.
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
# | Type | SC/TF/WG | Details |
6516 | SNARF | P47 Revision TF | Revision to SEMI P47, Test Method for Evaluation of Line-Edge Roughness and Linewidth Roughness |
Authorized Activities
None.
Authorized Ballots
# | When | TF | Details |
6456 | Cycle 1-2020 | Mask Orders TF | Revision to SEMI P45-0211, Specification For Job Deck Data Format For Mask Tools |
SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
Standard Designation | Title |
SEMI P9-1111 | Guide for Functional Testing of Microelectronic Resists |
SEMI P36-1108 (Reapproved 0913) | Guide for Magnification Reference for Critical Dimension Measurement Scanning Electron Microscopes (CD-SEM) |
SEMI P29-1111 | Specification for Characteristics Specific to Attenuated Phase Shift Masks and Masks Blanks |
SEMI P22-0307 | Guideline for Photomask Defect Classification and Size Definition |
Special Announcements of the Committee (Workshops, Programs, etc.)
None.
Next Meeting
July 22, 2020 Moscone Center in conjunction with SEMICON West. Check www.semi.org/standards
Copyright ©2024 Semiconductor Equipment and Materials International (SEMI®). All rights reserved.