SEMI International Standards
Standards Locale: North America
Committee: Micropatterning
Place of Meeting: Moscone South Hall - San Francisco, CA
Date of Meeting: 07/10/2019
Meeting End Date: 07/10/2019
Recording SEMI Standards Staff: Kevin Nguyen
CER Posted to Web: 07/17/2019


Leadership Changes
None.

Committee Structure Changes
None.

Ballot Results
None.

Ratification Ballot Results
None.

Activities Approved by the GCS between meetings of TC Chapter meeting

#
Type
SC/TF/WG
Details
6516SNARFP47 Revision TFRevision to SEMI P47, Test Method for Evaluation of Line-Edge Roughness and Linewidth Roughness


Authorized Activities
None.

Authorized Ballots

#
When
TF
Details
6456Cycle 1-2020Mask Orders TFRevision to SEMI P45-0211, Specification For Job Deck Data Format For Mask Tools


SNARF(s) Granted a One-Year Extension
None.

SNARF(s) Cancelled
None.

Standard(s) to receive Inactive Status

Standard Designation
Title
SEMI P9-1111Guide for Functional Testing of Microelectronic Resists
SEMI P36-1108 (Reapproved 0913)Guide for Magnification Reference for Critical Dimension Measurement Scanning Electron Microscopes (CD-SEM)
SEMI P29-1111 Specification for Characteristics Specific to Attenuated Phase Shift Masks and Masks Blanks
SEMI P22-0307 Guideline for Photomask Defect Classification and Size Definition


Special Announcements of the Committee (Workshops, Programs, etc.)
None.

Next Meeting
July 22, 2020 Moscone Center in conjunction with SEMICON West. Check www.semi.org/standards