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Standards Locale: North America

Committee: Liquid Chemicals

Place of Meeting: OVTCCM

Date of Meeting: 02/17/2021

Meeting End Date: 02/18/2021

Recording SEMI Standards Staff: Laura Nguyen

CER Posted to Web: 03/03/2021

Document #	Document Title	Committee Action	A&R Forms for Approved Ballots
6575A	Line Item Revision to SEMI F61-0617, Guide to Design and Operation of a Semiconductor Ultrapure Water System		6575A_Ballot Report.pdf
L1	Update Sections 10 and 17 and Appendices 1 and 7 to align with 2020 IRDS.	Passed, with editorial change(s)
6576A	Line Item Revision to SEMI F63-0918, Guide for Ultrapure Water Used in Semiconductor Processing		6576A_Ballot Report.pdf
L1	Provide clarification to limitations and Table 2	Passed, with editorial change(s)
L2	Update Table 1, including corresponding footnotes and text, to align with 2020 IRDS while also providing achievable limits with available metrology	Passed, as balloted
6577A	Line Item Revision to SEMI F75-0617, Guide for Quality Monitoring of Ultrapure Water Used in Semiconductor Manufacturing		6577A_Ballot Report.pdf
L1	Update Sections 5 and 8 to align with 2020 IRDS, while also providing achievable limits with available metrology	Passed, as balloted
6600	New Standard: Guide for Drain Segregation for Semiconductor Manufacturing Tools to Support Site Water Reuse	Passed, with technical changes, Ratification Ballot to be issued	6600_Ballot Report.pdf
6602	New Standard: Test Method for Determining pH of Chemical Mechanical Planarization (CMP) Slurries and Related Chemicals	Passed, with editorial change(s)	6602_Ballot Report.pdf
6603	Revision to SEMI F98-0618, Guide for Water Reuse in Semiconductor Industry	Passed, with editorial change(s)	6603_Ballot Report.pdf
6645A	Revision to SEMI F40-0699E (Reapproved 0918), Practice for Preparing Liquid Chemical Distribution Components for Chemical Testing, with title change to: Practice for Preparing Liquid Chemical Distribution Components and Neat Polymers for Chemical Testing	Passed, as balloted	6645A_Ballot Report.pdf
6646	New Standard: Guide for Reporting Density and Porosity of the Chemical Mechanical Planarization (CMP) Pads used in Semiconductor Manufacturing	Passed, with editorial change(s)	6646_Ballot Report.pdf
6652	Line Item Revision to SEMI F39-0315, Guide for Chemical Blending Systems		6652_Ballot Report.pdf
L1	Add Reference to SEMI E49.2 in § 4.1 and update to § 6.5 and 9.	Passed, as balloted
L2	Add “carboy” to bulleted list in § 7.1.	Passed, as balloted

Note 1: Passed ballots and line items will be submitted to the ISC Audit & Review Subcommittee for procedural review.

Note 2: Failed ballots and line items were returned to the originating task forces for re-work and re-balloting or abandoning.

Ratification Ballot Results
None.

Activities Approved by the GCS between meetings of TC Chapter meeting

#	Type	SC/TF/WG	Details
6645	SNARF/ Ballot Authorization	High Purity Polymer Material & Components TF	Revision to SEMI F40-0699E (Reapproved 0918), Practice for Preparing Liquid Chemical Distribution Components for Chemical Testing, with title change to: Practice for Preparing Liquid Chemical Distribution Components and Neat Polymers or Chemical Testing – TC Member Review took place between 03/11/2020-03/25/2020 – Approved by GCS on 04/30/2020
6646	SNARF	Chemical Mechanical Planarization Consumables (CMP-C) TF	New Standard: Guide for Reporting Density of the Chemical Mechanical Planarization (CMP) Pads used in Semiconductor Manufacturing – TC Member Review took place between 04/10/2020-04/24/2020 – Approved by GCS on 05/07/2020
6489	Ballot Authorization	CMP-C TF	New Standard: Guide for Reporting Chemical Mechanical Planarization (CMP) Polishing Pads Hardness Used in Semiconductor Manufacturing – Approved by GCS on 04/30/2020
6652	SNARF/ Ballot Authorization	High Purity Liquid Assemblies & System TF	Line Item Revision to SEMI F39-0315, Guide for Chemical Blending Systems – Approved by GCS on 05/21/2020
6653 6654 6655	SNARF	UPW TF	Revision to SEMI F61-0617, Guide to Design and Operation of a Semiconductor Ultrapure Water System Revision to SEMI F63-0918, Guide for Ultrapure Water Used in Semiconductor Processing Revision to SEMI F75-0617, Guide for Quality Monitoring of Ultrapure Water Used in Semiconductor Manufacturing – TC Member Review took place between 05/01/2020-05/14/2020 – Approved by GCS on 05/21/2020
--	Adjudication Locale Transfer	Liquid Chemicals NA TC	Transfer responsibilities for Letter Ballot review from the North America Chapter to the Japan Chapter for NA Ballots 6489, 6575, 6576, 6577, 6606, and 6645. –Approved by GCS on 07/29/2020
6603	Ballot Authorization	Water Management TF	Revision to SEMI F98-0618, Guide for Water Reuse in Semiconductor Industry – Approved by GCS on 08/12/2020
6646	SNARF Revision/ Ballot Authorization	CMP-C TF	New Standard: Guide for Reporting Density and Porosity of the Chemical Mechanical Planarization (CMP) Pads used in Semiconductor Manufacturing – TC Member Review took place between 08/02/2020-08/16/2020 – Approved by GCS on 09/09/2020
6602	SNARF Revision/ Ballot Authorization	CMP-C TF	New Standard: Test Method for Determining pH of Chemical Mechanical Planarization (CMP) Slurries and Related Chemicals – TC Member Review took place between 08/04/2020-08/17/2020 – Approved by GCS on 09/09/2020
6677	SNARF/Ballot Authorization	CMP-C TF	New Standard: Guide for Reporting Performance Parameters of the Chemical Mechanical Planarization (CMP) Conditioning Disks used in Semiconductor Manufacturing – TC Member Review took place between 08/17/2020-08/28/2020 – Approved by GCS on 09/09/2020
6600	Ballot Authorization	Water Management TF	New Standard: Guide for Drain Segregation for Semiconductor Manufacturing Tools to Support Site Water Reuse – Approved by GCS on 09/09/2020
6653 6654 6655	Ballot Authorization	UPW TF	Revision to SEMI F61-0617, Guide to Design and Operation of a Semiconductor Ultrapure Water System Revision to SEMI F63-0918, Guide for Ultrapure Water Used in Semiconductor Processing Revision to SEMI F75-0617, Guide for Quality Monitoring of Ultrapure Water Used in Semiconductor Manufacturing – Approved by GCS on 09/09/2020
6645A	Ballot Authorization	High Purity Polymer Material & Components TF	Revision to SEMI F40-0699E (Reapproved 0918), Practice for Preparing Liquid Chemical Distribution Components for Chemical Testing, with title change to: Practice for Preparing Liquid Chemical Distribution Components and Neat Polymers or Chemical Testing – Approved by GCS on 09/09/2020
--	Special online ballot for OVTCCM	Liquid Chemicals GTC	Authorizing the special online ballot for adoption of OVTCCM. –– Approved by GCS on 11/24/2020
6713	SNARF/ Ballot Authorization	High Purity Polymer Material & Components TF	Line Item Revision to SEMI C90-1015, Test Method and Specification for Testing Perfluoroalkoxy (PFA) Materials Used in Liquid Chemical Distribution Systems – Approved by GCS on 01/22/2021
6714	SNARF	Water Management TF	Line Item Revision to SEMI C93-0620, Guide for Determining the Quality of Ion Exchange Resin Used in Polish Applications of Ultrapure Water System – Approved by GCS on 01/22/2021
6715	SNARF	Water Management TF	New Standard: Guide for Measuring Particle Precursors in Ultrapure Water – TC Member Review took place between 01/06/2021-02/20/2021 – Approved by GCS on 01/22/2021
6716	SNARF	Water Management TF	Revision to SEMI C79-0819, Guide to Evaluate the Efficacy of Sub-15 nm Filters Used in Ultrapure Water (UPW) Distribution Systems – TC Member Review took place between 01/06/2021-02/20/2021 – Approved by GCS on 01/22/2021

Authorized Activities
Listing of all revised or new SNARF(s) approved by the Originating TC Chapter.

#	Type	SC/TF/WG	Details
6727	SNARF	Chemical Analytical Methods (CAM) TF	Line Item Revision to SEMI C96-0618: Test Method for Determining Density of Chemical Mechanical Polish (CMP) Slurries, with title change to: Test Method for Determining Density of Chemical Mechanical Planarization (CMP) Slurries
6728	SNARF	CAM TF	Line Item Title Revision to SEMI C99-0320: Test Method for Determining Conductivity of Chemical Mechanical Polish (CMP) Slurries and Related Chemicals, with title change to: Test Method for Determining Conductivity of Chemical Mechanical Planarization (CMP) Slurries and Related Chemicals

Note 1: SNARFs and TFOFs are available for review on the SEMI Web site at:

http://downloads.semi.org/web/wstdsbal.nsf/TFOFSNARF

Authorized Ballots
Listing of documents authorized by the Originating TC Chapter for Letter Ballot.

#	When	TF	Details
R6600	Cycle 3-2021	Water Management TF	New Standard: Guide for Drain Segregation for Semiconductor Manufacturing Tools to Support Site Water Reuse
6465	Cycle 3 or 4-2021	CAM TF	Line Item Revision for SEMI C36-1213, Specifications for Phosphoric Acid, to correct nonconforming title to “Specification for Phosphoric Acid”
6677	Cycle 3-2021	CMP-C TF	New Standard: Guide for Reporting Performance Parameters of the Chemical Mechanical Planarization (CMP) Conditioning Disks used in Semiconductor Manufacturing
6727	Cycle 3 or 4-2021	CAM TF	Line Item Revision to SEMI C96-0618: Test Method for Determining Density of Chemical Mechanical Polish (CMP) Slurries, with title change to: Test Method for Determining Density of Chemical Mechanical Planarization (CMP) Slurries
6728	Cycle 3 or 4-2021	CAM TF	Line Item Title Revision to SEMI C99-0320: Test Method for Determining Conductivity of Chemical Mechanical Polish (CMP) Slurries and Related Chemicals, with title change to: Test Method for Determining Conductivity of Chemical Mechanical Planarization (CMP) Slurries and Related Chemicals
6729	Cycle 3 or 4-2021	High Purity Polymer Materials & Components TF	Line Item Revision to SEMI F57-0120, Specification for Polymer Materials and Components Used in Ultrapure Water and Liquid Chemical Distribution Systems

SNARF(s) Granted a One-Year Extension

#	TF	Title	Expiration Date
6315	CAM TF	Line Item Revision to SEMI C30-0218, Specification for Hydrogen Peroxide	02/17/2022
6388	CAM TF	Revision to SEMI C44-0618, Specification and Guide for Sulfuric Acid	02/17/2022

SNARF(s) Cancelled
None.

Standard(s) to receive Inactive Status
None.

Special Announcements of the Committee (Workshops, Programs, etc.)
None.

Next Meeting

The next meeting is tentatively scheduled for late June, 2021 TBD. For more information, please visit the Standards Calendar at http://www.semi.org/standards.