Document # | Document Title | Committee Action | A&R Forms for Approved Ballots |
6575A | Line Item Revision to SEMI F61-0617, Guide to Design and Operation of a Semiconductor Ultrapure Water System | | 6575A_Ballot Report.pdf |
L1 | Update Sections 10 and 17 and Appendices 1 and 7 to align with 2020 IRDS. | Passed, with editorial change(s) | |
6576A | Line Item Revision to SEMI F63-0918, Guide for Ultrapure Water Used in Semiconductor Processing | | 6576A_Ballot Report.pdf |
L1 | Provide clarification to limitations and Table 2 | Passed, with editorial change(s) | |
L2 | Update Table 1, including corresponding footnotes and text, to align with 2020 IRDS while also providing achievable limits with available metrology | Passed, as balloted | |
6577A | Line Item Revision to SEMI F75-0617, Guide for Quality Monitoring of Ultrapure Water Used in Semiconductor Manufacturing | | 6577A_Ballot Report.pdf |
L1 | Update Sections 5 and 8 to align with 2020 IRDS, while also providing achievable limits with available metrology | Passed, as balloted | |
6600 | New Standard: Guide for Drain Segregation for Semiconductor Manufacturing Tools to Support Site Water Reuse | Passed, with technical changes, Ratification Ballot to be issued | 6600_Ballot Report.pdf |
6602 | New Standard: Test Method for Determining pH of Chemical Mechanical Planarization (CMP) Slurries and Related Chemicals | Passed, with editorial change(s) | 6602_Ballot Report.pdf |
6603 | Revision to SEMI F98-0618, Guide for Water Reuse in Semiconductor Industry | Passed, with editorial change(s) | 6603_Ballot Report.pdf |
6645A | Revision to SEMI F40-0699E (Reapproved 0918), Practice for Preparing Liquid Chemical Distribution Components for Chemical Testing, with title change to: Practice for Preparing Liquid Chemical Distribution Components and Neat Polymers for Chemical Testing | Passed, as balloted | 6645A_Ballot Report.pdf |
6646 | New Standard: Guide for Reporting Density and Porosity of the Chemical Mechanical Planarization (CMP) Pads used in Semiconductor Manufacturing | Passed, with editorial change(s) | 6646_Ballot Report.pdf |
6652 | Line Item Revision to SEMI F39-0315, Guide for Chemical Blending Systems | | 6652_Ballot Report.pdf |
L1 | Add Reference to SEMI E49.2 in § 4.1 and update to § 6.5 and 9. | Passed, as balloted | |
L2 | Add “carboy” to bulleted list in § 7.1. | Passed, as balloted | |
# | Type | SC/TF/WG | Details |
6645 | SNARF/ Ballot Authorization | High Purity Polymer Material & Components TF | Revision to SEMI F40-0699E (Reapproved 0918), Practice for Preparing Liquid Chemical Distribution Components for Chemical Testing, with title change to: Practice for Preparing Liquid Chemical Distribution Components and Neat Polymers or Chemical Testing
– TC Member Review took place between 03/11/2020-03/25/2020
– Approved by GCS on 04/30/2020 |
6646 | SNARF | Chemical Mechanical Planarization Consumables (CMP-C) TF | New Standard: Guide for Reporting Density of the Chemical Mechanical Planarization (CMP) Pads used in Semiconductor Manufacturing
– TC Member Review took place between 04/10/2020-04/24/2020
– Approved by GCS on 05/07/2020 |
6489 | Ballot Authorization | CMP-C TF | New Standard: Guide for Reporting Chemical Mechanical Planarization (CMP) Polishing Pads Hardness Used in Semiconductor Manufacturing
– Approved by GCS on 04/30/2020 |
6652 | SNARF/ Ballot Authorization | High Purity Liquid Assemblies & System TF | Line Item Revision to SEMI F39-0315, Guide for Chemical Blending Systems
– Approved by GCS on 05/21/2020 |
6653
6654
6655 | SNARF | UPW TF | Revision to SEMI F61-0617, Guide to Design and Operation of a Semiconductor Ultrapure Water System
Revision to SEMI F63-0918, Guide for Ultrapure Water Used in Semiconductor Processing
Revision to SEMI F75-0617, Guide for Quality Monitoring of Ultrapure Water Used in Semiconductor Manufacturing
– TC Member Review took place between 05/01/2020-05/14/2020
– Approved by GCS on 05/21/2020 |
-- | Adjudication Locale Transfer | Liquid Chemicals NA TC | Transfer responsibilities for Letter Ballot review from the North America Chapter to the Japan Chapter for NA Ballots 6489, 6575, 6576, 6577, 6606, and 6645.
–Approved by GCS on 07/29/2020 |
6603 | Ballot Authorization | Water Management TF | Revision to SEMI F98-0618, Guide for Water Reuse in Semiconductor Industry
– Approved by GCS on 08/12/2020 |
6646 | SNARF Revision/ Ballot Authorization | CMP-C TF | New Standard: Guide for Reporting Density and Porosity of the Chemical Mechanical Planarization (CMP) Pads used in Semiconductor Manufacturing
– TC Member Review took place between 08/02/2020-08/16/2020
– Approved by GCS on 09/09/2020 |
6602 | SNARF Revision/ Ballot Authorization | CMP-C TF | New Standard: Test Method for Determining pH of Chemical Mechanical Planarization (CMP) Slurries and Related Chemicals
– TC Member Review took place between 08/04/2020-08/17/2020
– Approved by GCS on 09/09/2020 |
6677 | SNARF/Ballot Authorization | CMP-C TF | New Standard: Guide for Reporting Performance Parameters of the Chemical Mechanical Planarization (CMP) Conditioning Disks used in Semiconductor Manufacturing
– TC Member Review took place between 08/17/2020-08/28/2020
– Approved by GCS on 09/09/2020 |
6600 | Ballot Authorization | Water Management TF | New Standard: Guide for Drain Segregation for Semiconductor Manufacturing Tools to Support Site Water Reuse
– Approved by GCS on 09/09/2020 |
6653
6654
6655 | Ballot Authorization | UPW TF | Revision to SEMI F61-0617, Guide to Design and Operation of a Semiconductor Ultrapure Water System
Revision to SEMI F63-0918, Guide for Ultrapure Water Used in Semiconductor Processing
Revision to SEMI F75-0617, Guide for Quality Monitoring of Ultrapure Water Used in Semiconductor Manufacturing
– Approved by GCS on 09/09/2020 |
6645A | Ballot Authorization | High Purity Polymer Material & Components TF | Revision to SEMI F40-0699E (Reapproved 0918), Practice for Preparing Liquid Chemical Distribution Components for Chemical Testing, with title change to: Practice for Preparing Liquid Chemical Distribution Components and Neat Polymers or Chemical Testing
– Approved by GCS on 09/09/2020 |
-- | Special online ballot for OVTCCM | Liquid Chemicals GTC | Authorizing the special online ballot for adoption of OVTCCM.
–– Approved by GCS on 11/24/2020 |
6713 | SNARF/ Ballot Authorization | High Purity Polymer Material & Components TF | Line Item Revision to SEMI C90-1015, Test Method and Specification for Testing Perfluoroalkoxy (PFA) Materials Used in Liquid Chemical Distribution Systems
– Approved by GCS on 01/22/2021 |
6714 | SNARF | Water Management TF | Line Item Revision to SEMI C93-0620, Guide for Determining the Quality of Ion Exchange Resin Used in Polish Applications of Ultrapure Water System
– Approved by GCS on 01/22/2021 |
6715 | SNARF | Water Management TF | New Standard: Guide for Measuring Particle Precursors in Ultrapure Water
– TC Member Review took place between 01/06/2021-02/20/2021
– Approved by GCS on 01/22/2021 |
6716 | SNARF | Water Management TF | Revision to SEMI C79-0819, Guide to Evaluate the Efficacy of Sub-15 nm Filters Used in Ultrapure Water (UPW) Distribution Systems
– TC Member Review took place between 01/06/2021-02/20/2021
– Approved by GCS on 01/22/2021 |
# | When | TF | Details |
R6600 | Cycle 3-2021 | Water Management TF | New Standard: Guide for Drain Segregation for Semiconductor Manufacturing Tools to Support Site Water Reuse |
6465 | Cycle 3 or 4-2021 | CAM TF | Line Item Revision for SEMI C36-1213, Specifications for Phosphoric Acid, to correct nonconforming title to “Specification for Phosphoric Acid” |
6677 | Cycle 3-2021 | CMP-C TF | New Standard: Guide for Reporting Performance Parameters of the Chemical Mechanical Planarization (CMP) Conditioning Disks used in Semiconductor Manufacturing |
6727 | Cycle 3 or 4-2021 | CAM TF | Line Item Revision to SEMI C96-0618: Test Method for Determining Density of Chemical Mechanical Polish (CMP) Slurries, with title change to: Test Method for Determining Density of Chemical Mechanical Planarization (CMP) Slurries |
6728 | Cycle 3 or 4-2021 | CAM TF | Line Item Title Revision to SEMI C99-0320: Test Method for Determining Conductivity of Chemical Mechanical Polish (CMP) Slurries and Related Chemicals, with title change to: Test Method for Determining Conductivity of Chemical Mechanical Planarization (CMP) Slurries and Related Chemicals |
6729 | Cycle 3 or 4-2021 | High Purity Polymer Materials & Components TF | Line Item Revision to SEMI F57-0120, Specification for Polymer Materials and Components Used in Ultrapure Water and Liquid Chemical Distribution Systems |