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SEMI International Standards
SEMI New Activity Report Form (SNARF)



Activity Number: 5048
SNARF for: Revision to SEMI P37-1109, Specification for Extreme Ultraviolet Lithography Mask Substrates


Originating Global Technical Committee: Micropatterning
Originating Technical Committee Region: North America
Task Force in which work is to be carried out: EUV Mask Task Force


1. Rationale: Add method for reflectivity uniformity and to make corrections in the related information.

Defining alternate method for determining EUV blank reflectivity uniformity would result fewer blank specifications.

Related information may be pulled if the information can get into the ITRS.
Rate the Estimated Effect on the Industry
4: Slight effect or effect not determinable

Rate the Estimated Technical Difficulty of the Activity
II: Some Difficulty - Disagreements on known requirements exist but developing consensus is possible

2. Scope:
a: Define the areas to be covered or addressed by this activity or document:
Addition of definition of total reflectivity uniformity to be used as an option instead of specifying reflectivity uniformity and median wavelength deviation.

Coordination with ITRS activities to ensure that performance values are present
Removal of related information

b: Expected result of activity
Revision to an existing Standard/Guideline

3. Projected Timetable for Completion:
a: General Milestones
a. Activity Start: 07/01/2010b. 1st Draft by: 11/01/2010
c. Preballot by: d. Technical Ballot by: 10/04/2010
e. Committee Approval By:03/01/2011

b: Activity Specific Milestones
a. Proof of Concept b. Acquisition of Resources:
c. Safety Checklist Completed



Safety Considerations:
The resulting document is expected NOT to be a Safety Guideline


Intellectual Property Considerations:
a. In complying with the standard or safety guideline to be developed, the use of patented technology or a copyrighted item(s) is NOT required
b. The body of the standard and any appendices or related information sections will NOT include copyrighted material

Comments, Special Circumstances: None.

Approval: Activity approved by Committee/GCS on July 13, 2010