SEMI International Standards
SEMI New Activity Report Form (SNARF)

Activity Number: 5424
SNARF for: Revision of SEMI M62-1111, Specifications for Silicon Epitaxial Wafers (Addition of 450 mm Epi Guide)

Originating Global Technical Committee: Silicon Wafer
Originating Technical Committee Region: North America
Task Force in which work is to be carried out: International Epitaxial Wafers Task Force

1. Rationale: Addition of 450 mm wafer and Table R2-8 Epi wafer guide for 22nm technology Generation in M62-1011
It will make the guide applicable to 450mm wafer size and 22mm technology for the fabrication of current and near future geometries.

Rate the Estimated Effect on the Industry
2: Major effect on an industry sector - identify the relevant sector

Rate the Estimated Technical Difficulty of the Activity
I: No Difficulty - Proven concepts and techniques exist or quick agreement anticipated

2. Scope:
a: Define the areas to be covered or addressed by this activity or document:

1) Addition of line items to Table R2-8
2) Corrections to Table R2-7 on lines 2-5.1 and 2-6
3) Addition of 450mm diameter wafer to appropriate sections of the Table(s)

b: Expected result of activity
Revision to an existing Standard/Guideline

3. Projected Timetable for Completion:
a: General Milestones
a. Activity Start: 04/02/2012b. 1st Draft by: 04/02/2012
c. Preballot by: d. Technical Ballot by: 05/01/2012
e. Committee Approval By:07/01/2012

Safety Considerations:
The resulting document is expected NOT to be a Safety Guideline

Intellectual Property Considerations:
a. In complying with the standard or safety guideline to be developed, the use of patented technology or a copyrighted item(s) is NOT required
b. The body of the standard and any appendices or related information sections will NOT include copyrighted material

Comments, Special Circumstances: None.

Approval: Activity approved by Committee/GCS on April 26, 2012