SEMI International Standards
Task Force Organization Form (TFOF)
Task Force Name: EUV Reticle Fiducial Mark Task Force
|Global Technical Committee: Micropatterning|
|Originating Technical Committee Region: North America|
Generate a SEMI standard for methods of EUV reticle fiducial marks necessary for their use as a solution of EUVL mask infrastructure.
This includes, but is not limited to fiducial marks on: mask substrate, mask blank, and other mask layers such as absorber.
3. Formal linkages with Task Forces in other Regions:
No linkages reported
Task Force formed on: 02/29/2008
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