SEMI International Standards
Task Force Organization Form (TFOF)

Task Force Name: EUV Reticle Fiducial Mark Task Force

Global Technical Committee: Micropatterning
Originating Technical Committee Region: North America

1. Charter:

Generate a SEMI standard for methods of EUV reticle fiducial marks necessary for their use as a solution of EUVL mask infrastructure.

2. Scope:

This includes, but is not limited to fiducial marks on: mask substrate, mask blank, and other mask layers such as absorber.

3. Formal linkages with Task Forces in other Regions:
No linkages reported

4. Approval:
Task Force formed on: 02/29/2008