SEMI International Standards
Task Force Organization Form (TFOF)


Task Force Name: EUV Reticle Fiducial Mark Task Force


Global Technical Committee: Micropatterning
Originating Technical Committee Region: North America


1. Charter:


Generate a SEMI standard for methods of EUV reticle fiducial marks necessary for their use as a solution of EUVL mask infrastructure.


2. Scope:

This includes, but is not limited to fiducial marks on: mask substrate, mask blank, and other mask layers such as absorber.


3. Formal linkages with Task Forces in other Regions:
No linkages reported

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4. Approval:
Task Force formed on: 02/29/2008