SEMI International Standards
TASK FORCE ORGANIZATION FORM (TFOF)
Date Prepared: 02/29/2008Revised (if Applicable):

Name of Task Force (TF): EUV Reticle Fiducial Mark Task Force

Global Technical Committee: Micropatterning
Originating Technical Committee Region: North America


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1. Charter: (State the objective of the proposed TF.)

Generate a SEMI standard for methods of EUV reticle fiducial marks necessary for their use as a solution of EUVL mask infrastructure.

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2. Scope: (Define the specific activities that the TF will conduct.)

This includes, but is not limited to fiducial marks on: mask substrate, mask blank, and other mask layers such as absorber.

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3. Formal linkages with TFs in other Regions/Locales: (Show each associated TF and its parent global technical committee; indicate nature of relationship – global TF, observer TF, etc.)

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4. Formation Date:(TF formed on)

Task Force formed on: 02/29/2008
Task Force approved by Committee/GCS on: 02/29/2008