Activity Number: 4771
SNARF for: New Standard: Particle Removal Test Method for Equipment Fan Filter Unit (EFFU)
SEMI International Standards
SEMI New Activity Report Form (SNARF)
1. Rationale: Clean Technology is critical to the semiconductor production line. If a semiconductor production line does not operate in ultra clean levels, foreign particles introduced during the process may prevent production of semiconductor device to exact specifications. Therefore, Clean Technology is critical to the production line.
|Originating Global Technical Committee: Facilities|
|Originating Technical Committee Region: Korea|
|Task Force in which work is to be carried out: Equipment Cleanness Task Force |
Most manufacturers of EFFUs would like to reduce the cost of having several EFFU developments as well as cost of respective mass production equipment fitted to each EFFU by setting up a standard for both EFFU and mass production equipment. Thus, standardization of EFFUs is very necessary for achieving low cost and high energy efficiency.
Therefore, there is a need to develop a test method and specification that will be generally reliable and acceptable in order to standardize EFFUs and spread out standard guidelines of EFFUs.
Rate the Estimated Effect on the Industry
3: Major effect on a few companies - identify the relevant companies
Rate the Estimated Technical Difficulty of the Activity
II: Some Difficulty - Disagreements on known requirements exist but developing consensus is possible
a: Define the areas to be covered or addressed by this activity or document:
This standard intends to provide a test method for EFFUs. It focuses on its particle removal characteristic. The standard which is about test procedure for EFFUs characterization includes following item:
1. Test method of particle removal performance
Place the test EFFU filled with test particles in a chamber while a discrete particle counter (DPC) is monitoring the particle concentration, not in the chamber.
Start the EEFU and monitor the particle concentration with DPC until the particle concentration, N, reaches 0.01*No.
Find the best fit line from the concentration change graph. The slope of the best fit line is the particle removal characteristic of EFFU.
The objective of this standard is to provide a method for performance testing and reporting based upon consistent procedures. This can then be referenced by and integrated into a relevant industry recommended for field practice or suggestions of standard.
b: Expected result of activity
3. Projected Timetable for Completion:
|a: General Milestones|
|a. Activity Start: 03/03/2009||b. 1st Draft by: 10/17/2011|
|c. Preballot by: ||d. Technical Ballot by: 10/17/2011|
|e. Committee Approval By:07/30/2012|
The resulting document is expected NOT to be a Safety Guideline
Intellectual Property Considerations:
a. In complying with the standard or safety guideline to be developed, the use of patented technology or a copyrighted item(s) is NOT required
b. The body of the standard and any appendices or related information sections will NOT include copyrighted material
Comments, Special Circumstances: Background:
1. The SNARF was approved by NA Facilities on July 22, 2009 and it is transferred to Korea Facilities and approved on October 21, 2010
2. The transferred SNARF is also revised its scope on September 21, 2011.
3. The title of the SNARF has been changes from "New Standard: Test Method for Equipment Fan Filter Unit (EFFU) Particle Removal " to "New Standard; Particle Removal Test Method for Equipment Fan Filter Unit (EFFU)" on June 20, 2012
Approval: Activity approved by Committee/GCS on September 21, 2011
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