SEMI International Standards
Task Force Organization Form (TFOF)


Task Force Name: PV wafer measurement method Task Force


Global Technical Committee: Photovoltaic
Originating Technical Committee Region: Taiwan


1. Charter:


Due to increasing demand for quality, PV Si Wafer Metrology such as Geometry (Dimensions, TTV, Warp/Sori) Electrical Character (Resistivity, Carrier Lifetime), Visible and Non-Visible Defect, Saw-Mark, Stain on Wafer Surface, etc., have become standard test requirements for c-Si (both Mono- and Multi- ) wafer manufacturing. However, no standard has been set in this field. As a result, c-Si solar wafer manufacturers are confused by very different specs with their customers, which dramatically increases the cost and add loading in process control. This standard aims to gather industry consensus and provide a qualification and/or classification criteria for c-Si Wafer Metrology.


2. Scope:

1. This standard will cover Metrology and Defects of wafers.
2. A draft will be proposed with minimum preoccupied preference to either wafer manufacturers or cell manufacturers. Instead, all the metrics were proposed base on how the defect(s) will actually impact the cell reliability, performance or production yield.
3. At the wafer manufacturing process, the inspection method will cover the wafers made by the newly developed diamond wire saw.


3. Formal linkages with Task Forces in other Regions:
No linkages reported

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4. Approval:
Task Force formed on: 03/30/2010