SEMI International Standards
Document Status Report

This page provides a the status of documents being worked on by various Task Forces in the SEMI International Standards program.

Use the pull-down menu below to browse a particular committee.


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MEMS / NEMS

5267New Standard, Specification for Microfluidic Port and Pitch DimensionsFailed Technical Review and Returned to TF 07/13/2017Region of Action- NA
5267ANew Standard, Specification for Microfluidic Port and Pitch DimensionsPublished as SEMI MS11-0318 03/30/2018Region of Action- NA
5870ALine item revision to SEMI MS4-1113, Standard Test Method for Young's Modulus Measurements of Thin, Reflecting Films Based on the Frequency of Beams in Resonance with title change to: Test Method for Young's Modulus Measurements of Thin, Reflecting Films Based on the Frequency of Beams in ResonanceSee Line Items Below Region of Action- NA
5870A
LI - 1
Correct the Title of SEMI MS4 from “Standard Test Method” to “Test Method”Published 04/28/2016Region of Action- NA
6007New Standard: Guide for Use of Test Patterns for Characterizing a Deep Reactive Ion Etching (DRIE) ProcessPublished as SEMI MS13-0221 02/19/2021Region of Action- NA
6018New Standard: Specification for Silicon Substrates used in fabrication of MEMS DevicesPublished as SEMI MS12-0220 02/21/2020Region of Action- NA
6176Reapproval of SEMI MS1-0307 (Reapproved 0812), Guide to Specifying Wafer-Wafer Bonding Alignment TargetPublished 03/09/2018Region of Action- NA
6177Reapproval of SEMI MS10-0912, Test Method to Measure Fluid Permeation Through MEMS Packaging MaterialsPublished 03/16/2018Region of Action- NA
6463Reapproval of SEMI MS2-1113, Test Method for Step Height Measurements of Thin FilmsPublished 08/30/2019Region of Action- NA
6464Reapproval of SEMI MS5-0813, Test Method for Wafer Bond Strength Measurements Using Micro-Chevron Test StructuresPublished 08/30/2019Region of Action- NA
6746New Standard: Guide for Critical Parameters of Gas SensorsFailed Technical Review and Returned to TF 07/14/2021Region of Action- NA
6746ANew Standard: Guide for Critical Parameters of Gas SensorsPublished as SEMI MS14-0422 04/07/2022Region of Action- NA
6843Reapproval of SEMI MS4-0416, Test Method for Young's Modulus Measurements of Thin, Reflecting Films Based on the Frequency of Beams in ResonancePublished 05/31/2022Region of Action- NA
6844Reapproval of SEMI MS8-0309 (Reapproved 0915), Guide to Evaluating Hermeticity of Microelectromechanical Systems (MEMS) PackagesPublished 06/10/2022Region of Action- NA
R6007New Standard: Guide for Use of Test Patterns for Characterizing a Deep Reactive Ion Etching (DRIE) ProcessPublished as SEMI MS13-0221 02/19/2021Region of Action- NA