5267 | New Standard, Specification for Microfluidic Port and Pitch Dimensions | Failed Technical Review and Returned to TF 07/13/2017 | Region of Action- NA |
5267A | New Standard, Specification for Microfluidic Port and Pitch Dimensions | Published as SEMI MS11-0318 03/30/2018 | Region of Action- NA |
5870A | Line item revision to SEMI MS4-1113, Standard Test Method for Young's Modulus Measurements of Thin, Reflecting Films Based on the Frequency of Beams in Resonance with title change to: Test Method for Young's Modulus Measurements of Thin, Reflecting Films Based on the Frequency of Beams in Resonance | See Line Items Below | Region of Action- NA |
5870A LI - 1 | Correct the Title of SEMI MS4 from “Standard Test Method” to “Test Method” | Published 04/28/2016 | Region of Action- NA |
6007 | New Standard: Guide for Use of Test Patterns for Characterizing a Deep Reactive Ion Etching (DRIE) Process | Published as SEMI MS13-0221 02/19/2021 | Region of Action- NA |
6018 | New Standard: Specification for Silicon Substrates used in fabrication of MEMS Devices | Published as SEMI MS12-0220 02/21/2020 | Region of Action- NA |
6176 | Reapproval of SEMI MS1-0307 (Reapproved 0812), Guide to Specifying Wafer-Wafer Bonding Alignment Target | Published 03/09/2018 | Region of Action- NA |
6177 | Reapproval of SEMI MS10-0912, Test Method to Measure Fluid Permeation Through MEMS Packaging Materials | Published 03/16/2018 | Region of Action- NA |
6463 | Reapproval of SEMI MS2-1113, Test Method for Step Height Measurements of Thin Films | Published 08/30/2019 | Region of Action- NA |
6464 | Reapproval of SEMI MS5-0813, Test Method for Wafer Bond Strength Measurements Using Micro-Chevron Test Structures | Published 08/30/2019 | Region of Action- NA |
6746 | New Standard: Guide for Critical Parameters of Gas Sensors | Failed Technical Review and Returned to TF 07/14/2021 | Region of Action- NA |
6746A | New Standard: Guide for Critical Parameters of Gas Sensors | Published as SEMI MS14-0422 04/07/2022 | Region of Action- NA |
6843 | Reapproval of SEMI MS4-0416, Test Method for Young's Modulus Measurements of Thin, Reflecting Films Based on the Frequency of Beams in Resonance | Published 05/31/2022 | Region of Action- NA |
6844 | Reapproval of SEMI MS8-0309 (Reapproved 0915), Guide to Evaluating Hermeticity of Microelectromechanical Systems (MEMS) Packages | Published 06/10/2022 | Region of Action- NA |
R6007 | New Standard: Guide for Use of Test Patterns for Characterizing a Deep Reactive Ion Etching (DRIE) Process | Published as SEMI MS13-0221 02/19/2021 | Region of Action- NA |