| 3846 info | Revision to SEMI E10-0304E, Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM) | Drafting 02/28/2011 | Region of Action- NA |
| 3846A | Revision To SEMI E10-0304E, Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM), with title change to: Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM) and Utilization | Published 03/22/2012 | Region of Action- NA |
| 3847B | Revision to SEMI E33- SPECIFICATION FOR SEMICONDUCTOR MANUFACTURING FACILITY ELECTROMAGNETIC COMPATIBILITY | Failed Technical Review and Returned to TF 07/14/2010 | Region of Action- NA |
| 3847C | Revision of SEMI E33-94, Specification for Semiconductor Manufacturing Facility Electromagnetic Compatibility, with title change to: Guide for Semiconductor Manufacturing Equipment Electromagnetic Compatibility (EMC) | Failed Technical Review and Returned to TF 10/26/2011 | Region of Action- NA |
| 3847D | Revision to SEMI E33-94, Specification for Semiconductor Manufacturing Facility Electromagnetic Compatibility
with title change to:
Guide for Semiconductor Manufacturing Equipment Electromagnetic Compatibility (EMC) | Published 10/30/2012 | Region of Action- NA |
| 4241 | Revision of E43, Guide for Measuring Static Charge on Objects and Surfaces | Published 09/25/2008 | Region of Action- NA |
| 4285 | SEMI E114-0302E, Test Method for RF Cable Assemblies Used in Semiconductor Processing Equipment RF Power Delivery Systems | Published 01/28/2009 | Region of Action- NA |
| 4579 | Revision to SEMI E78-0708, Guide To Assess And Control Electrostatic Discharge (ESD) And Electrostatic Attraction (ESA) For Equipment | Published 01/19/2009 | Region of Action- NA |
| 4638 | Reapproval of SEMI E115-0302, Test Method for Determining the Load Impedance and Efficiency of Matching Networks used in Semiconductor Processing Equipment – RF Power Delivery Systems | Published 01/28/2009 | Region of Action- NA |
| 4704 | NEW Standard: Specification of Wafer Manufacturing Cycle Time on Generic Model | Failed Technical Review and Returned to TF 09/10/2009 | Region of Action- Japan |
| 4704A | New Standard: Definition of Process Time and Wait Time | Failed Technical Review and Returned to TF 01/15/2010 | Region of Action- Japan |
| 4704B | New Standard: Definition of Active Time and Wait Time | Drafting 10/13/2010 | Region of Action- Japan |
| 4730 | New Standard: Guide for Identification and Classification of Training Levels | Failed Technical Review and Returned to TF 11/10/2010 | Region of Action- NA |
| 4730A | New Standard: Guide for Identification and Classification of Training Tiers | Published as SEMI E161-0611 06/03/2011 | Region of Action- NA |
| 4731 | Revision to E129-0706, Guide to Assess and Control Electrostatic Charge in a Semiconductor Manufacturing Facility | Published 05/22/2009 | Region of Action- NA |
| 4783 | New Standard: Guide for the Handling of Reticles and Other Extremely Electrostatic Sensitive (EES) Items Within Specially Designated Areas | Failed Technical Review and Returned to TF 07/13/2011 | Region of Action- NA |
| 4783A | New Standard: Guide for the Handling of Reticles and Other Extremely Electrostatic Sensitive (EES) Items Within Specially Designated Areas | Published as SEMI E163-0212 02/29/2012 | Region of Action- NA |
| 5049 | Revision to SEMI E35-0307, Guide to Calculate Cost Of Ownership (COO) Metrics for Semiconductor Manufacturing Equipment | Published 03/09/2012 | Region of Action- NA |
| 5050 | Revision to SEMI E140-0305, Guide to Calculate Cost Of Ownership (COO) Metrics for Gas Delivery Systems | Published 03/09/2012 | Region of Action- NA |
| 5062 | Reapproval of SEMI E104-0303 - Specification for Integration and Guideline for Calibration of Low-Pressure Particle Monitor | Published 02/28/2011 | Region of Action- Europe |
| 5063 | Reapproval of SEMI E141-0705 - Guide for Specification of Ellipsometer Equipment for Use in Integrated Metrology | Published 02/28/2011 | Region of Action- Europe |
| 5066 | New Auxiliary Document: Electrostatics Guide | Auxiliary Information Published 06/24/2011 | Region of Action- NA |
| 5169 | Revision of SEMI E78-0309, Guide to Assess and Control Electrostatic Discharge (ESD) and Electrostatic Attraction (ESA) for Equipment | Published 09/28/2012 | Region of Action- NA |
| 5233 | New Standard: Guide for Comprehensive Equipment Training Systems when Dedicated Training Equipment is Not Available | Published as SEMI E165-0712 07/20/2012 | Region of Action- NA |
| 5234 | Reapproval of E135-0704, Test Method for RF Generators to Determine Transient Response for RF Power Delivery Systems Used in Semiconductor Processing Equipment | Published 05/31/2012 | Region of Action- NA |
| 5235 | Reapproval of E113-0306, Specification for Semiconductor Processing Equipment RF Power Delivery Systems | Published 05/31/2012 | Region of Action- NA |
| 5236 | Reapproval of E136-1104, Test Method for Determining the Output Power of RF Generators Used in Semiconductor Processing Equipment RF Power Delivery Systems | Published 05/31/2012 | Region of Action- NA |
| 5237 | Reapproval of E143-0306, Test Method for Measuring Power and Variation into a 50-Ω Load and Power Variation and Spectrum into a Load with a VSWR of 2.0 at any phase Angle | Published 05/31/2012 | Region of Action- NA |
| 5238 | Revisions of SEMI E129-0709, Guide to Assess and Control Electrostatic Charge in a Semiconductor Manufacturing Facility | Published 09/28/2012 | Region of Action- NA |
| 5340 | Revision to SEMI E10-0312, Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM) and Utilization | Passed Technical Review - Awaiting Procedural Review 04/02/2014 | Region of Action- NA |
| 5341 | Revision to SEMI E79-1106, Specification for Definition and Measurement of Equipment Productivity | Passed Technical Review - Awaiting Procedural Review 04/02/2014 | Region of Action- NA |
| 5470 | Reapproval of SEMI E124-1107, Guide for Definition and Calculation of Overall Factory Efficiency (OFE) and Other Associated Factory-Level Productivity Metrics | Published 03/29/2013 | Region of Action- NA |
| 5471 | Reapproval of SEMI E89-0707, Guide for Measurement System Analysis (MSA) | Published 03/29/2013 | Region of Action- NA |
| 5472 | Revision to SEMI E43-1108, Recommended Practice for Electrostatic Measurements on Objects and Surfaces with title change to: Guide for Electrostatic Measurements on Objects and Surfaces | Published 08/21/2013 | Region of Action- NA |
| 5525 | Reapproval of SEMI E150-1107, Guide for Equipment Training Best Practices | Failed Technical Review and Returned to TF 04/03/2013 | Region of Action- NA |
| 5526 | Line Item Revisions to SEMI E165-0712, Guide for Comprehensive Equipment Training Systems when Dedicated Training Equipment is not Available | See Line Items Below | Region of Action- NA |
5526
LI - 1 | Revisions to Paragraph 5.2.1 | Published 08/30/2013 | Region of Action- NA |
5526
LI - 2 | Revisions to Paragraph 5.2.2 | Published 08/30/2013 | Region of Action- NA |
| 5592 | New Standard: Specification for Product Time Measurement | Published as SEMI E168-0114 01/24/2014 | Region of Action- NA |
| 5627 | Revision to Add a New Subordinate Standard: Specification for Product Time Measurement in GEM 300 Production Equipment to SEMI Draft Document 5592, New Standard: Specification for Product Time Measurement | Published 01/24/2014 | Region of Action- NA |
| 5645 | Revision to SEMI E149-0708, Guide for Equipment Supplier-Provided Documentation for the Acquisition and Use of Manufacturing Equipment | Published 03/14/2014 | Region of Action- NA |
| 5646 | Revision to SEMI E150-1107, Guide for Equipment Training Best Practices | Published 03/14/2014 | Region of Action- NA |