SEMI International Standards
Document Status Report

This page provides a the status of documents being worked on by various Task Forces in the SEMI International Standards program.

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3846 infoRevision to SEMI E10-0304E, Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM)Drafting 02/28/2011Region of Action- NA
3846ARevision To SEMI E10-0304E, Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM), with title change to: Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM) and UtilizationPublished 03/22/2012Region of Action- NA
3847BRevision to SEMI E33- SPECIFICATION FOR SEMICONDUCTOR MANUFACTURING FACILITY ELECTROMAGNETIC COMPATIBILITYFailed Technical Review and Returned to TF 07/14/2010Region of Action- NA
3847CRevision of SEMI E33-94, Specification for Semiconductor Manufacturing Facility Electromagnetic Compatibility, with title change to: Guide for Semiconductor Manufacturing Equipment Electromagnetic Compatibility (EMC)Failed Technical Review and Returned to TF 10/26/2011Region of Action- NA
3847DRevision to SEMI E33-94, Specification for Semiconductor Manufacturing Facility Electromagnetic Compatibility with title change to: Guide for Semiconductor Manufacturing Equipment Electromagnetic Compatibility (EMC)Published 10/30/2012Region of Action- NA
4241Revision of E43, Guide for Measuring Static Charge on Objects and SurfacesPublished 09/25/2008Region of Action- NA
4285SEMI E114-0302E, Test Method for RF Cable Assemblies Used in Semiconductor Processing Equipment RF Power Delivery Systems Published 01/28/2009Region of Action- NA
4579Revision to SEMI E78-0708, Guide To Assess And Control Electrostatic Discharge (ESD) And Electrostatic Attraction (ESA) For EquipmentPublished 01/19/2009Region of Action- NA
4638Reapproval of SEMI E115-0302, Test Method for Determining the Load Impedance and Efficiency of Matching Networks used in Semiconductor Processing Equipment – RF Power Delivery SystemsPublished 01/28/2009Region of Action- NA
4704NEW Standard: Specification of Wafer Manufacturing Cycle Time on Generic ModelFailed Technical Review and Returned to TF 09/10/2009Region of Action- Japan
4704ANew Standard: Definition of Process Time and Wait TimeFailed Technical Review and Returned to TF 01/15/2010Region of Action- Japan
4704BNew Standard: Definition of Active Time and Wait TimeDrafting 10/13/2010Region of Action- Japan
4730New Standard: Guide for Identification and Classification of Training LevelsFailed Technical Review and Returned to TF 11/10/2010Region of Action- NA
4730ANew Standard: Guide for Identification and Classification of Training TiersPublished as SEMI E161-0611 06/03/2011Region of Action- NA
4731Revision to E129-0706, Guide to Assess and Control Electrostatic Charge in a Semiconductor Manufacturing FacilityPublished 05/22/2009Region of Action- NA
4783New Standard: Guide for the Handling of Reticles and Other Extremely Electrostatic Sensitive (EES) Items Within Specially Designated AreasFailed Technical Review and Returned to TF 07/13/2011Region of Action- NA
4783ANew Standard: Guide for the Handling of Reticles and Other Extremely Electrostatic Sensitive (EES) Items Within Specially Designated AreasPublished as SEMI E163-0212 02/29/2012Region of Action- NA
5049Revision to SEMI E35-0307, Guide to Calculate Cost Of Ownership (COO) Metrics for Semiconductor Manufacturing EquipmentPublished 03/09/2012Region of Action- NA
5050Revision to SEMI E140-0305, Guide to Calculate Cost Of Ownership (COO) Metrics for Gas Delivery SystemsPublished 03/09/2012Region of Action- NA
5062Reapproval of SEMI E104-0303 - Specification for Integration and Guideline for Calibration of Low-Pressure Particle MonitorPublished 02/28/2011Region of Action- Europe
5063Reapproval of SEMI E141-0705 - Guide for Specification of Ellipsometer Equipment for Use in Integrated MetrologyPublished 02/28/2011Region of Action- Europe
5066New Auxiliary Document: Electrostatics GuideAuxiliary Information Published 06/24/2011Region of Action- NA
5169Revision of SEMI E78-0309, Guide to Assess and Control Electrostatic Discharge (ESD) and Electrostatic Attraction (ESA) for EquipmentPublished 09/28/2012Region of Action- NA
5233New Standard: Guide for Comprehensive Equipment Training Systems when Dedicated Training Equipment is Not Available Published as SEMI E165-0712 07/20/2012Region of Action- NA
5234Reapproval of E135-0704, Test Method for RF Generators to Determine Transient Response for RF Power Delivery Systems Used in Semiconductor Processing Equipment Published 05/31/2012Region of Action- NA
5235Reapproval of E113-0306, Specification for Semiconductor Processing Equipment RF Power Delivery SystemsPublished 05/31/2012Region of Action- NA
5236Reapproval of E136-1104, Test Method for Determining the Output Power of RF Generators Used in Semiconductor Processing Equipment RF Power Delivery SystemsPublished 05/31/2012Region of Action- NA
5237Reapproval of E143-0306, Test Method for Measuring Power and Variation into a 50-Ω Load and Power Variation and Spectrum into a Load with a VSWR of 2.0 at any phase AnglePublished 05/31/2012Region of Action- NA
5238Revisions of SEMI E129-0709, Guide to Assess and Control Electrostatic Charge in a Semiconductor Manufacturing FacilityPublished 09/28/2012Region of Action- NA
5340Revision to SEMI E10-0312, Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM) and UtilizationPublished 08/29/2014Region of Action- NA
5341Revision to SEMI E79-1106, Specification for Definition and Measurement of Equipment ProductivityPublished 08/29/2014Region of Action- NA
5470Reapproval of SEMI E124-1107, Guide for Definition and Calculation of Overall Factory Efficiency (OFE) and Other Associated Factory-Level Productivity MetricsPublished 03/29/2013Region of Action- NA
5471Reapproval of SEMI E89-0707, Guide for Measurement System Analysis (MSA)Published 03/29/2013Region of Action- NA
5472Revision to SEMI E43-1108, Recommended Practice for Electrostatic Measurements on Objects and Surfaces with title change to: Guide for Electrostatic Measurements on Objects and SurfacesPublished 08/21/2013Region of Action- NA
5525Reapproval of SEMI E150-1107, Guide for Equipment Training Best PracticesFailed Technical Review and Returned to TF 04/03/2013Region of Action- NA
5526Line Item Revisions to SEMI E165-0712, Guide for Comprehensive Equipment Training Systems when Dedicated Training Equipment is not Available See Line Items Below Region of Action- NA
5526
LI - 1
Revisions to Paragraph 5.2.1Published 08/30/2013Region of Action- NA
5526
LI - 2
Revisions to Paragraph 5.2.2Published 08/30/2013Region of Action- NA
5592New Standard: Specification for Product Time MeasurementPublished as SEMI E168-0114 01/24/2014Region of Action- NA
5627Revision to Add a New Subordinate Standard: Specification for Product Time Measurement in GEM 300 Production Equipment to SEMI Draft Document 5592, New Standard: Specification for Product Time MeasurementPublished 01/24/2014Region of Action- NA
5645Revision to SEMI E149-0708, Guide for Equipment Supplier-Provided Documentation for the Acquisition and Use of Manufacturing EquipmentPublished 03/14/2014Region of Action- NA
5646Revision to SEMI E150-1107, Guide for Equipment Training Best PracticesPublished 03/14/2014Region of Action- NA
5682Revision to SEMI E168-0114, Specification for Product Time MeasurementPublication Process Started 08/25/2014Region of Action- NA
5683Revision to SEMI E168.1-0114, Specification for Product Time Measurement in GEM 300 Production EquipmentPublication Process Started 08/25/2014Region of Action- NA