5229B | Revision to SEMI P44, Specification for Open Artwork System Interchange Standard (OASIS) Specific to Mask Tools | Published 03/31/2016 | Region of Action- Japan |
5906 | Line Item Revision to SEMI P39-0308, OASIS (TM) - Open Artwork System Interchange Standard (To correct nonconforming title) | See Line Items Below | Region of Action- NA |
5906 LI - 1 | Correct the title of this standard for conformance by adding the word “Specification for” | Published 04/22/2016 | Region of Action- NA |
5907 | Revision to SEMI P5-0704, Specification for Pellicles ( To include material for EUV pellicle) | Published 04/28/2016 | Region of Action- NA |
5908 | Reapproval for SEMI P40-1109, Specification for Mounting Requirements for Extreme Ultraviolet Lithography Masks | Published 04/22/2016 | Region of Action- NA |
5909 | Reapproval for SEMI P48-1110, Specification of Fiducial Marks for EUV Mask Blank | Published 04/22/2016 | Region of Action- NA |
6040 | Line Item Revision to SEMI P44-0316 Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask Tools | Drafting 07/27/2016 | Region of Action- NA |
6040 | Line Item Revision to SEMI P44-0316 Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask Tools | See Line Items Below | Region of Action- NA |
6040 LI - 1 | Make the changes to the tables listed below. | Published 12/14/2016 | Region of Action- NA |
6327 | Revision to SEMI P45-0211, Specification For Job Deck Data Format For Mask Tools | Published 12/24/2018 | Region of Action- NA |
6456 | Revision to SEMI P45-0211, Specification For Job Deck Data Format For Mask Tools | Failed Technical Review and Returned to TF 07/22/2020 | Region of Action- NA |
6456A | Revision to SEMI P45-0211, Specification For Job Deck Data Format For Mask Tools | Published 04/23/2021 | Region of Action- NA |
6807 | Reapproval of SEMI P5-0416 Specification for Pellicles | Published 12/17/2021 | Region of Action- NA |
6808 | Reapproval of SEMI P40-1109 (Reapproved 0416) Specification for Mounting Requirements for Extreme Ultraviolet Lithography Masks | Published 12/17/2021 | Region of Action- NA |
6809 | Reapproval of SEMI P48-1110 (Reapproved 0416) Specification of Fiducial Marks for EUV Mask Blank | Published 12/17/2021 | Region of Action- NA |
6821 | NEW PRELIMINARY STANDARD: Specification For Experimental Curvilinear “Multigon” Extension to SEMI P39 | Published as SEMI P49-0823 (Preliminary) 08/04/2023 | Region of Action- NA |
7026 | Reapproval of SEMI P44-1216 Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask Tools
| Published 01/31/2024 | Region of Action- NA |
7027 | Reapproval of SEMI P39-0416 Specification for OASIS® – Open Artwork System Interchange Standard
| Failed Technical Review and Returned to TF 10/31/2023 | Region of Action- NA |
R6327 | Ratification Ballot, Revision to SEMI P45-0211, Specification For Job Deck Data Format For Mask Tools | Published 12/24/2018 | Region of Action- NA |