SEMI International Standards
Document Status Report

This page provides a the status of documents being worked on by various Task Forces in the SEMI International Standards program.

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Micropatterning

5229BRevision to SEMI P44, Specification for Open Artwork System Interchange Standard (OASIS) Specific to Mask ToolsPublished 03/31/2016Region of Action- Japan
5906Line Item Revision to SEMI P39-0308, OASIS (TM) - Open Artwork System Interchange Standard (To correct nonconforming title)See Line Items Below Region of Action- NA
5906
LI - 1
Correct the title of this standard for conformance by adding the word “Specification for” Published 04/22/2016Region of Action- NA
5907Revision to SEMI P5-0704, Specification for Pellicles ( To include material for EUV pellicle)Published 04/28/2016Region of Action- NA
5908Reapproval for SEMI P40-1109, Specification for Mounting Requirements for Extreme Ultraviolet Lithography MasksPublished 04/22/2016Region of Action- NA
5909Reapproval for SEMI P48-1110, Specification of Fiducial Marks for EUV Mask BlankPublished 04/22/2016Region of Action- NA
6040Line Item Revision to SEMI P44-0316 Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask ToolsDrafting 07/27/2016Region of Action- NA
6040Line Item Revision to SEMI P44-0316 Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask ToolsSee Line Items Below Region of Action- NA
6040
LI - 1
Make the changes to the tables listed below.Published 12/14/2016Region of Action- NA
6327Revision to SEMI P45-0211, Specification For Job Deck Data Format For Mask ToolsPublished 12/24/2018Region of Action- NA
6456Revision to SEMI P45-0211, Specification For Job Deck Data Format For Mask ToolsFailed Technical Review and Returned to TF 07/22/2020Region of Action- NA
6456ARevision to SEMI P45-0211, Specification For Job Deck Data Format For Mask ToolsPublished 04/23/2021Region of Action- NA
6807Reapproval of SEMI P5-0416 Specification for Pellicles Published 12/17/2021Region of Action- NA
6808Reapproval of SEMI P40-1109 (Reapproved 0416) Specification for Mounting Requirements for Extreme Ultraviolet Lithography MasksPublished 12/17/2021Region of Action- NA
6809Reapproval of SEMI P48-1110 (Reapproved 0416) Specification of Fiducial Marks for EUV Mask Blank Published 12/17/2021Region of Action- NA
6821NEW PRELIMINARY STANDARD: Specification For Experimental Curvilinear “Multigon” Extension to SEMI P39Published as SEMI P49-0823 (Preliminary) 08/04/2023Region of Action- NA
7026Reapproval of SEMI P44-1216 Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask Tools Published 01/31/2024Region of Action- NA
7027Reapproval of SEMI P39-0416 Specification for OASIS® – Open Artwork System Interchange Standard Failed Technical Review and Returned to TF 10/31/2023Region of Action- NA
R6327Ratification Ballot, Revision to SEMI P45-0211, Specification For Job Deck Data Format For Mask ToolsPublished 12/24/2018Region of Action- NA