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 | 3D Packaging and Integration Committee |
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| SNARF | | | | | Doc 7019 - Reapproval of SEMI G64-1118,Specification for Full-Plated Integrated Circuit Leadframes (Au, Ag, Cu, Ni, Pd/Ni, Pd) | |
| SNARF | | | | | Doc 7020 - Reapproval of SEMI G94-0113 (Reapproved 1118) Specification for Coin-Stack Type Tape Frame Shipping Container for 300 mm Wafer | |
| SNARF | | | | | Doc 7099 - Revision to SEMI 3D3-0613 (Reapproved 1218), Guide for Multiwafer Transport and Storage Containers for 300 mm, Thin Silicon Wafers on Tape Frames | |
| SNARF | | | | | Doc 7100 - Revision to SEMI 3D4-0915 (Reapproved 0222), Guide for Metrology for Measuring Thickness, Total Thickness Variation (TTV), Bow, Warp/Sori, and Flatness of Bonded Wafer Stacks | |
| SNARF | | | | | Doc 7101 - Revision to SEMI 3D5-0314 (Reapproved 1218), Guide for Metrology Techniques to be Used in Measurement of Geometrical Parameters of Through-Silicon Vias (TSVs) in 3DS-IC Structures | |
| SNARF | | | | | Doc 7102 - Revision to SEMI 3D17-1217, Specification for Reference Material for Bonded Wafer Stack Void Metrology | |
| Compound Semiconductor Materials Committee |
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| SNARF | | | | | Doc 7053 - Line Item Revision of SEMI M63, TEST METHOD FOR MEASURING THE Al FRACTION IN AlGaAs ON GaAs SUBSTRATES BY HIGH RESOLUTION X-RAY DIFFRACTION | |
| EH&S Committee |
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| SNARF | | | | | Doc 7021 - Line Items Revisions of S2 Environmental, Health, and Safety Guideline for Semiconductor Manufacturing Equipment, and S22 Safety Guideline for the Electrical Design of Semiconductor Manufacturing Equipment | |
| SNARF | | | | | Doc 7022 - Line Item Revision to SEMI S30, Safety Guideline for Use of Energetic Materials in Semiconductor R&D and Manufacturing Processes (energetic materials)
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| SNARF | | | | | Doc 7023 - Reapproval of SEMI S6, Environmental, Health, And Safety Guideline For Exhaust Ventilation Of Semiconductor Manufacturing Equipment
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| SNARF | | | | | Doc 7028 - Reapproval of SEMI S21-0818, Safety Guideline for Worker Protection | |
| TFOF | | | | | S2 Major Revision Task Force | |
| Facilities Committee |
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| SNARF | | | | | Doc 7084 - Reapproval of SEMI F44-0307 (Reapproved 0818), Specification for Machined Stainless Steel Weld Fittings | |
| SNARF | | | | | Doc 7085 - Reapproval of SEMI F45-0307 (Reapproved 0818), Specification for Machined Stainless Steel Reducing Weld Fittings | |
| Flexible Hybrid Electronics (FHE) Committee |
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| SNARF | | | | | Doc 7104 - New Standard: Test Method of Electromyography Sensing Technology of Flexible Hybrid Electronics and Electronic Textiles | |
| Gases Committee |
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| SNARF | | | | | Doc 7052 - Line-Item Revision to SEMI F20-0706, Specification for 316L Stainless Steel Bar, Forgings, Extruded Shapes, Plate, and Tubing for Components used in General Purpose, High Purity and Ultra-high Purity Semiconductor Manufacturing Applications | |
| SNARF | | | | | Doc 7092 - Line-Item Revision to SEMI E29-1110 (Reapproved 0417), Terminology for the Calibration of Mass Flow Controllers and Mass Flow Meters | |
| SNARF | | | | | Doc 7093 - Line-Item Revision to SEMI F62-1016, Test Method for Determining Mass Flow Controller Performance Characteristics for Ambient and Gas Temperature Effects | |
| SNARF | | | | | Doc 7094 - Reapproval of SEMI E16-0517, Guide for Determining and Describing Mass Flow Controller Leak Rates | |
| SNARF | | | | | Doc 7095 - Reapproval of SEMI E27-1017, Guide for Mass Flow Controller and Mass Flow Meter Linearity | |
| SNARF | | | | | Doc 7096 - Reapproval of SEMI E66-0611 (Reapproved 0517), Test Method for Determining Particle Contribution by Mass Flow Controllers | |
| SNARF | | | | | Doc 7097 - Line-Item Revision to SEMI C54-1116, Specification for Oxygen | |
| SNARF | | | | | Doc 7098 - Line-Item Revision to SEMI C56-1116, Specification for Dichlorosilane | |
| Information & Control Committee |
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| SNARF | | | | | Doc 7063 - Reapproval of SEMI E39-1218, Specification for Object Services: Concepts, Behavior, and Services | |
| SNARF | | | | | Doc 7064 - Reapproval of SEMI E40-1218, Specification for Processing Management | |
| SNARF | | | | | Doc 7065 - Line Item Revision to SEMI E172-0320, Specification for SECS Equipment Data Dictionary (SEDD) | |
| SNARF | | | | | Doc 7066 - Line Item Revision to SEMI E87-0921, Specification for Carrier Management (CMS) and SEMI E87.1-0921, Specification for SECS-II Protocol for Carrier Management (CMS) | |
| SNARF | | | | | Doc 7067 - Line tem Revision to SEMI E133-1218, Specification for Automated Process Control Systems Interface and SEMI E133.1-0318, Specification for XML Messaging for Process Control System (PCS) | |
| SNARF | | | | | Doc 7068 - New Standard: Specification for Equipment Data Publication | |
| SNARF | | | | | Doc 7069 - Revision to Add a New Subordinate Standard: Specification for Common Data for Etch Components to Specification for Equipment Data Publication | |
| SNARF | | | | | Doc 7070 - Revision to Add a New Subordinate Standard: Specification for Common Data for Vacuum Components to Specification for Equipment Data Publication | |
| SNARF | | | | | Doc 7103 -
Line Item Revision to SEMI E187(0122)- Specification for Cybersecurity of Fab Equipment
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| Liquid Chemicals Committee |
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| SNARF | | | | | Doc 7086 - Revision to SEMI F61–0521, Guide for Design and Operation of a Semiconductor Ultrapure Water System | |
| SNARF | | | | | Doc 7087 - Revision to SEMI F63-0521, Guide for Ultrapure Water Used in Semiconductor Processing | |
| SNARF | | | | | Doc 7088 - Revision to SEMI F75-0521, Guide for Quality Monitoring of Ultrapure Water Used in Semiconductor Manufacturing | |
| SNARF | | | | | Doc 7089 - Line-Item Revision to SEMI C78-0113 (Reapproved 1218), Test Method for Determining Roughness of Polymer Surfaces Used in Ultrapure Water and Liquid Chemical Distribution Systems by Atomic Force Microscopy | |
| SNARF | | | | | Doc 7090 - Line-Item Revision to SEMI C87-0515, Test Method for Determining Roughness of Polymer Surfaces Used in Ultrapure Water and Liquid Chemical Distribution Systems by Contact Profilometry | |
| SNARF | | | | | Doc 7091 - Revision to SEMI C90-1015, Test Method and Specification for Testing Perfluoroalkoxy (PFA) Materials Used in Liquid Chemical Distribution Systems, with title change to: Test Method and Specification for Testing of Perfluoroalkoxy (PFA) and Other Fluorinated Materials Used in Liquid Chemical Distribution Systems | |
| Metrics Committee |
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| SNARF | | | | | Doc 7056 - Reapproval of SEMI E168-0915, Specification for Product Time Measurement | |
| SNARF | | | | | Doc 7057 - Reapproval of SEMI E168.1-1114, Specification for Product Time Measurement in GEM 300 Production Equipment | |
| SNARF | | | | | Doc 7058 - Reapproval of SEMI E168.2-0915, Specification for Product Time Measurement for Material Control Systems | |
| SNARF | | | | | Doc 7059 - Reapproval of SEMI E168.3-0915, Specification for Product Time Measurement for Transport | |
| Micropatterning Committee |
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| SNARF | | | | | Doc 6821 - New Standard: Specification for Improved Curvilinear Layout Representation | |
| SNARF | | | | | Doc 7026 - Reapproval of SEMI P44-1216 Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask Tools
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| SNARF | | | | | Doc 7027 - Reapproval of SEMI P39-0416 Specification for OASIS® – Open Artwork System Interchange Standard
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| Photovoltaic Committee |
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| SNARF | | | | | Doc 7047 - Reapproval of SEMI PV82-0318, Specification for Terrestrial Dual-Glass Module with Crystalline Silicon Solar Cell | |
| SNARF | | | | | Doc 7048 - Reapproval of SEMI PV83-0318, Guide for Sample Preparation Method for Photovoltaic Backsheet Performance Tests | |
| SNARF | | | | | Doc 7049 - Reapproval of SEMI PV85-1018, Practice for Metal Wrap Through (MWT) Back Contact Photovoltaic (PV) Module Assembly | |
| SNARF | | | | | Doc 7050 - Reapproval of SEMI PV87-1018, Test Method for Peeling Force Between Electrode and Ribbon/Back Sheet | |
| SNARF | | | | | Doc 7054 - Reapproval of SEMI PV81-0318, Guide for Specifying Low Pressure Horizontal Diffusion Furnace | |
| SNARF | | | | | Doc 7055 - New Standard: Guide for Tube PECVD Graphite Boat Materials for Solar Cell Production | |
| Photovoltaic (PV) - Materials Committee |
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| SNARF | | | | | Doc 7051 - Reapproval of SEMI PV88-1018, Test Method for Determination of Hydrogen in Photovoltaic (PV) Polysilicon by Inert Gas Fusion Infrared Absorption Method | |
| Silicon Wafer Committee |
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| SNARF | | | | | Doc 7024 - Line Item Revision to SEMI M1-0918,Specification for Polished Single Crystal Silicon Wafers
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| SNARF | | | | | Doc 7025 - Line Item Revision of SEMI MF1529-1110: Test Method for “Sheet Resistance Uniformity Evaluation by In-Line Four-Point Probe with the Dual-Configuration Procedure”
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| SNARF | | | | | Doc 7029 - Reapproval of SEMI M61-0612 (Reapproved 0319)Specification for Silicon Epitaxial Wafers with Buried Layers
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| SNARF | | | | | Doc 7030 - Reapproval of SEMI MF95-1107 (Reapproved 0718) Test Method for Thickness of Lightly Doped Silicon Epitaxial Layers on Heavily Doped Silicon Substrates Using an Infrared Dispersive Spectrophotometer
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| SNARF | | | | | Doc 7031 - Reapproval of SEMI MF950-1107 (Reapproved 0718) Test Method for Measuring the Depth of Crystal Damage of a Mechanically Worked Silicon Wafer Surface by Angle Polished and Defect Etching
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| SNARF | | | | | Doc 7032 - Reapproval of SEMI MF84-0312 (Reapproved 0718) Test Method for Measuring Resistivity of Silicon Wafers With an In-Line Four-Point Prober
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| SNARF | | | | | Doc 7033 - Reapproval of SEMI MF672-0412 (Reapproved 1018) Guide for Measuring Resistivity Profiles Perpendicular to the Surface of a Silicon Wafer Using a Spreading Resistance Probe
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| SNARF | | | | | Doc 7034 - Reapproval of SEMI MF671-0312 (Reapproved 0718) Test Method for Measuring Flat Length on Wafers of Silicon and Other Electronic Materials
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| SNARF | | | | | Doc 7035 - Reapproval of SEMI MF576-0812 (Reapproved 0718)) Test Method for Measurement of Insulator Thickness and Refractive Index on Silicon Substrates by Ellipsometry
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| SNARF | | | | | Doc 7036 - Reapproval of SEMI MF533-0310 (Reapproved 0416) Test Method for Thickness and Thickness Variation of Silicon Wafers | |
| SNARF | | | | | Doc 7037 - Reapproval of SEMI MF525-0312 (Reapproved 0718) Test Method for Measuring Resistivity of Silicon Wafers Using a Spreading Resistance Probe | |
| SNARF | | | | | Doc 7038 - Reapproval of SEMI MF523-1107 (Reapproved 0718) Practice for Unaided Visual Inspection of Polished Silicon Wafer Surfaces | |
| SNARF | | | | | Doc 7039 - Reapproval of SEMI MF397-0812 (Reapproved 0718) Test Method for Resistivity of Silicon Bars Using a Two-Point Probe | |
| SNARF | | | | | Doc 7040 - Reapproval of SEMI MF374-0312 (Reapproved 0718)Test Method for Sheet Resistance of Silicon Epitaxial, Diffused, Polysilicon, and Ion-implanted Layers Using an In-Line Four-Point Probe with the Single-Configuration Procedure | |
| SNARF | | | | | Doc 7041 - Reapproval of SEMI MF26-0714E Test Method for Determining the Orientation of a Semiconductive Single Crystal | |
| SNARF | | | | | Doc 7042 - Reapproval of SEMI MF2074-0912 (Reapproved 0718) Guide for Measuring Diameter of Silicon and Other Semiconductor Wafers | |
| SNARF | | | | | Doc 7043 - Reapproval of SEMI MF1982-0317 Test Method for Analyzing Organic Contaminants on Silicon Wafer Surfaces by Thermal Desorption Gas Chromatography | |
| SNARF | | | | | Doc 7044 - Reapproval of SEMI MF1763-0318 Test Method for Measuring Contrast of a Linear Polarizer | |
| SNARF | | | | | Doc 7045 - Reapproval of SEMI MF1630-1107 (Reapproved 0718) Test Method for Low Temperature FT-IR Analysis of Single Crystal Silicon for III-V Impurities | |
| SNARF | | | | | Doc 7046 - Reapproval of SEMI MF1619-1107 (Reapproved 0718) Test Method for Measurement of Interstitial Oxygen Content of Silicon Wafers by Infrared Absorption Spectroscopy with p-Polarized Radiation Incident at the Brewster Angle
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| SNARF | | | | | Doc 7072 - Reapproval of SEMI MF1569-0307 (Reapproved 0718) Guide for Generation of Consensus Reference Materials for Semiconductor Technology
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| SNARF | | | | | Doc 7073 - Reapproval of SEMI MF1527-0412 (Reapproved 1018) Guide for Application of Certified Reference Materials and Reference Wafers for Calibration and Control of Instruments for Measuring Resistivity of Silicon | |
| SNARF | | | | | Doc 7074 - Reapproval of SEMI MF1392-0307 (Reapproved 0718) Test Method for Determining Net Carrier Density Profiles in Silicon Wafers by Capacitance-Voltage Measurements with a Mercury Probe | |
| SNARF | | | | | Doc 7075 - Reapproval of SEMI MF1391-1107 (Reapproved 0912) Test Method for Substitutional Atomic Carbon Content of Silicon by Infrared Absorption | |
| SNARF | | | | | Doc 7076 - Reapproval of SEMI MF1388-0707 (Reapproved 0718) Test Method for Generation Lifetime and Generation Velocity of Silicon Material by Capacitance-Time Measurements of Metal-Oxide-Silicon (MOS) Capacitors | |
| SNARF | | | | | Doc 7077 - Reapproval of SEMI MF1366-0308 (Reapproved 1018) Test Method for Measuring Oxygen Concentration in Heavily Doped Silicon Substrates by Secondary Ion Mass Spectrometrys | |
| SNARF | | | | | Doc 7078 - Reapproval of SEMI MF1188-1107 (Reapproved 0718) Test Method for Interstitial Oxygen Content of Silicon by Infrared Absorption With Short Baseline | |
| SNARF | | | | | Doc 7079 - Reapproval of SEMI MF110-1107 (Reapproved 0718) Test Method for Thickness of Epitaxial or Diffused Layers in Silicon by the Angle Lapping and Staining Technique | |
| SNARF | | | | | Doc 7080 - Reapproval of SEMI MF1049-0308 (Reapproved 1018) Practice for Shallow Etch Pit Detection on Silicon Wafers | |
| SNARF | | | | | Doc 7081 - Reapproval of SEMI M8-0312 (Reapproved 0718) Specification for Polished Monocrystalline Silicon Test Wafers | |
| SNARF | | | | | Doc 7082 - Reapproval of SEMI M56-1018 Practice for Determining Cost Components for Metrology Equipment Due to Measurement Variability and Bias | |
| SNARF | | | | | Doc 7083 - Reapproval of SEMI M38-0312 (Reapproved 0718) Specification for Polished Reclaimed Silicon Wafers | |
| Traceability Committee |
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| SNARF | | | | | Doc 7060 - Reapproval of SEMI T17-0706 (Reapproved 0718), Specification of Substrate Traceability | |
| SNARF | | | | | Doc 7061 - Reapproval of SEMI T10-0701 (Reapproved 0618), Test Method for the Assessment of 2D Data Matrix Direct Mark Quality | |
| SNARF | | | | | Doc 7062 - Reapproval of SEMI T18-1106 (Reapproved 0718), Specification of Parts and Components Traceability | |