SEMI International Standards
Standards New Activity Report Form (SNARF)
Date Prepared: Revised (if Applicable):

Document Number: 6983
SNARF for: Revision for M49 “GUIDE FOR SPECIFYING GEOMETRY MEASUREMENT SYSTEMS FOR SILICON WAFERS FOR THE 130 nm TO 16 nm TECHNOLOGY GENERATIONS"

Originating Global Technical Committee: Silicon Wafer
Originating TC Chapter: Japan
Task Force (TF) in which work is to be carried out: International Advanced Wafer Geometry Task Force
Note: If a new task force is needed, also submit a task force organization form (TFOF)

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1. Rationale:
a. Describe the need or problem addressed by this activity.
(Indicate the customer, what benefits they will receive, and if possible, quantify the impact on the return on investment [ROI] if the Document is implemented.)
Current M49-0918 is discussing guide of performances for geometry measurement systems along with technology generation of the 130nm to 16nm, however market is moving to below 3nm. Then it is required to extend beyond 16nm to 3nm technology generation. Another point is the current technology generation in M49 is referenced with ITRS scaling, but ITRS was already closed and took over with IRDS, which provides practical reference values of minimum feature size at each process node including multiple patterning and/or immersion litho technologies. The reference values from IRDS provide guide for additional technology generation beyond 16nm. We would like to update the value to be met with current market requirements and editorial changes if any


b. Estimate effect on industry.
1: Major effect on entire industry or on multiple important industry sectors - identify the relevant sectors
Sector or Company Information: Silicon Suppliers and users, Equipment suppliers etc.

c. Estimate technical difficulty of the activity.
III: Difficult - Limited expertise and resources exist and/or achieving consensus is difficult

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2. Scope:
a: Describe the technical areas to be covered or addressed by this Document development activity. For Subordinate Standards, list common concepts or criteria that the Subordinate Standard inherits from the Primary Standard, as well as differences from the Primary Standard:
1. SFQR is the most important parameters for M49. The values for SFQR were same value of technology generation for 130nm to 16nm along with starting material of ITRS. For 11, 7, 5, and 3nm. IRDS provides the minimum pitch at critical metal layer for logic device application, and calculate DOF for each technology node including multiple patterning technique with available litho tool resolution. Max SFQR values is converted as 1/3 of DOF as widely used. The reference wafer flatness SFQR to be used in the table is 2/3 of Max SFQR as well as existing M49.
2. Delete 450mm wafer delete from all technology generation.
3. GBIR: Add 200nm beyond 16nm
4. Nanotopography. SEMI Nanotopography defined to remove less than 20mm wavelength on the surface for shallow trench isolation application. This was already solved the issue. Then no more nanotopography beyond 16nm technology node.
5. ESFQR/ZDD. Added new value beyond 16nm technology generation.
6. Correction of level 3sigma, matching and bias at current table, since there are discrepancy values.

b: Expected result of activity
Major revision to an existing Standard or Safety Guideline

For a new Subordinate Standard, identify the Primary Standard here:


Modification of an existing part of Standard(s) or Safety Guideline(s) including Appendices, Complementary Files, and Supplementary Materials

For Standards, identify the Standard Subtype below:
Guide

Miscellaneous (describe below):

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3. Projected Timetable for Completion:

a: General Milestones
a. Activity Start: 11/15/2022b. 1st Draft by: 12/01/2022
c. (Optional) Informational Ballot by: 02/01/2023d. Letter Ballot by: 04/01/2023
e. TC Chapter Approval By:04/01/2023

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4. Liaisons with other Global Technical Committees/TC Chapters/Subcommittees/TFs:
a. List SEMI global technical committees, TC Chapters, subcommittees, or task forces in your or other Regions/Locales that should be kept informed regarding the progress of this activity. (Refer to SEMI Standards organization charts and global technical committee charters and scopes as needed.)


b. List any planned Type I Liaisons with external nonprofit organizations (e.g., SDO) that should receive Draft Documents from Standards staff for feedback during this activity and be notified when the Letter Ballot is issued (refer to Procedure Manual § 7):


c. Intercommittee Ballots:
will not be issued

Identify the recipient global technical committee(s):

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5. Safety Considerations:
The resulting document is expected:
NOT to be a Safety Guideline

NOTE FOR "to be a Safety Guideline": When all safety-related information is removed from the Document, the Document is NOT technically sound and complete - Refer to Section 15.1 of the Regulations for special procedures to be followed.

NOTE FOR "NOT to be a Safety Guideline": When all safety-related information is removed from the Document, the Document is still technically sound and complete.

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6. Intellectual Property Considerations:
Note: Both a: and b: below should be checked for Revision of existing Standard(s) and Safety Guideline(s).

a. For a new Standard or Safety Guideline and for any part to be modified or added in a Revision of published Standards and Safety Guidelines:
patented technology is intended to be included in the proposed Standard(s) or Safety Guideline(s).

If "patented technology is intended to be included in the proposed Standard(s) or Safety Guideline(s) " is selected above, then also check one:
Letter of Intent received

b. For Revision, Reapproval, Reinstatement, or Withdrawal of existing Standard(s) and Safety Guideline(s):


c. The body of the Document and any Appendices, Complementary Files, Related Information sections, or Various Materials that may or may not be a part of the Document by reference:
the incorporation of Copyrighted Item will NOT be required



NOTE FOR ‘the use of patented technology or the incorporation of Copyrighted Item(s) is NOT required’: If in the course of developing the Document, it is determined that the use of patented technology or Copyrighted Item(s) is necessary for the Document, the provisions of Regulations § 16 must be followed.

NOTE FOR ’will incorporate Copyrighted Item’: A copyright release letter must be obtained from the copyright owner prior to publication.

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7. Comments, Special Circumstances:
None.

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8. TC Member Review:
took place between (put dates below ) before approval at the TC Chapter Meeting, or

Member Review Start Date; 11/01/2022
Member Review End Date: 11/15/2022

NOTE FOR ‘TC Member Review’ is required by the Regulations for a period of at least two weeks
before approval of a new, or a major revision of an existing, Standard or Safety Guideline. (Refer to Regulations ¶ 8.2.1)
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9. SNARF Approval Dates:
TC Chapter or GCS11/16/2022
Recorded in TC Minutes11/16/2022

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10. SNARF Extension Dates:
TC Chapter Extension Granted on
Extension Expires on