SEMI International Standards
Date Prepared: 07/14/2021
Revised (if Applicable):

Name of Task Force (TF): Curvilinear Format Task Force

Global Technical Committee: Micropatterning
Originating Technical Committee Region: North America

1. Charter: (State the objective of the proposed TF.)
Revise existing or create new standards to improve representation of curvilinear IC layout structures resulting from the use of Inverse Lithography Technology (ILT) Optical Proximity Correction (OPC) methods in advanced IC manufacturing mask synthesis processes and in silicon photonic manufacturing.
2. Scope: (Define the specific activities that the TF will conduct.)
Define new structure definitions to more efficiently represent curved layout shapes. Revise existing or create new standards that incorporate these new structure definitions. Influence extends from OPC output to mask manufacturing including OPC, Mask Process Correction (MPC), fracture for mask lithography, and compatibility with mask metrology, inspection, and repair.
3. Formal linkages with TFs in other Regions/Locales: (Show each associated TF and its parent global technical committee; indicate nature of relationship – global TF, observer TF, etc.)
Mask Orders TF
4. Formation Date:(TF formed on)

Task Force formed on: 07/14/2021
Task Force approved by Committee/GCS on: 07/14/2021