SEMI International Standards TASK FORCE ORGANIZATION FORM (TFOF)

Date Prepared: 12/18/1998

Revised (if Applicable): 02/29/2008

Name of Task Force (TF): EUV Mask Task Force

Global Technical Committee: Micropatterning

Originating Technical Committee Region: North America

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1. Charter: (State the objective of the proposed TF.)
Generate a SEMI standard for EUV reticles and the accompanying material necessary for their use as a lithography solution.
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2. Scope: (Define the specific activities that the TF will conduct.)
This includes, but is not limited to: substrate, pellicles, resists, mask layers and absorbers, chucking, carriers.
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3. Formal linkages with TFs in other Regions/Locales: (Show each associated TF and its parent global technical committee; indicate nature of relationship – global TF, observer TF, etc.)
EUV Reticle Handling TF (Under PI&C Committee)
EUV Reticle Fiducial Mark (Under Microlithography Committee)
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4. Formation Date:(TF formed on)

Task Force formed on: 01/21/1999
Task Force approved by Committee/GCS on:

5. Comments
None.