SEMI International Standards
SEMI New Activity Report Form (SNARF)

Activity Number: 5542
SNARF for: Line Items Revision to SEMI M62-0413, Specifications for Silicon Epitaxial Wafers

Originating Global Technical Committee: Silicon Wafer
Originating Technical Committee Region: North America
Task Force in which work is to be carried out: International Epitaxial Wafers Task Force

1. Rationale: 1. Make Revision of Tables R2-7 & R2-8 - Change 3-2.7 Nanotopography value and related Foot Note #9. The document will be called Doc. 5424B.
2. Add diameter information to Item 2-6.1 Table R2-7, R2-8
3. Add Some editorial changes

Rate the Estimated Effect on the Industry
2: Major effect on an industry sector - identify the relevant sector

Rate the Estimated Technical Difficulty of the Activity
IV: Extremely Difficult - Expertise and resources are scarce and/or achieving consensus very difficult

2. Scope:
a: Define the areas to be covered or addressed by this activity or document:
Make changes in 3-2.7 Nanotopography value and related Foot Note #9 in Tables R2-7 & R2-8.

b: Expected result of activity
Revision to an existing Standard/Guideline

3. Projected Timetable for Completion:
a: General Milestones
a. Activity Start: 12/07/2012b. 1st Draft by: 04/01/2013
c. Preballot by: d. Technical Ballot by: 04/17/2013
e. Committee Approval By:07/01/2013

Safety Considerations:
The resulting document is expected NOT to be a Safety Guideline

Intellectual Property Considerations:
a. In complying with the standard or safety guideline to be developed, the use of patented technology or a copyrighted item(s) is NOT required
b. The body of the standard and any appendices or related information sections will NOT include copyrighted material

Comments, Special Circumstances: None.

Approval: Activity approved by Committee/GCS on December 6, 2012