SEMI International Standards
TASK FORCE ORGANIZATION FORM (TFOF)
Date Prepared:
02/29/2008
Revised (if Applicable):
Name of Task Force (TF):
EUV Reticle Fiducial Mark Task Force
Global Technical Committee:
Micropatterning
Originating Technical Committee Region:
North America
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1. Charter:
(State the objective of the proposed TF.)
Generate a SEMI standard for methods of EUV reticle fiducial marks necessary for their use as a solution of EUVL mask infrastructure.
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2. Scope:
(Define the specific activities that the TF will conduct.)
This includes, but is not limited to fiducial marks on: mask substrate, mask blank, and other mask layers such as absorber.
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3. Formal linkages with TFs in other Regions/Locales:
(Show each associated TF and its parent global technical committee; indicate nature of relationship – global TF, observer TF, etc.)
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4. Formation Date:
(TF formed on)
Task Force formed on:
02/29/2008
Task Force approved by Committee/GCS on:
02/29/2008
5. Comments
None.
