SEMI International Standards
Date Prepared: 06/16/2014
Revised (if Applicable): 07/13/2017

Name of Task Force (TF): Energetic Materials EHS Task Force

Global Technical Committee: EH&S
Originating Technical Committee Region: North America

1. Charter: (State the objective of the proposed TF.)
Background: Based on international device manufacturing accident and incident experience over the last four(4) years (2011-2014) with new energetic compounds being used to support advanced semiconductor process, a total of 70+ incidents have been documented, with some causing loss of life, significant facility damage and production business interruption. Based on this experience, a majority of leading semiconductor device manufacturers (GLOBALFOUNDRIES, IBM, Intel, Samsung, SK Hynix, TI, TSMC along with CNSE) have determined the need to for a comprehensive international best known methods safety guideline for safe use, handling, processing and disposal of reactive hazardous materials which have or may exhibit energetic properties.

Charter: Develop EHS guidance for the entire supply chain to assist in timely and accurate characterization of energetic processing materials. Propose design considerations for equipment, delivery system, pump and abatement manufacturers. Identify handling, use and disposal best practices, as well as, operation, maintenance and emergency response criteria for end users.

2. Scope: (Define the specific activities that the TF will conduct.)
• Energetic materials that are within the proposed scope of this document are chemicals or substances used in semiconductor R&D and Manufacturing Processes which exhibit one or more of the following properties:
– Is classified as a pyrophoric substance such as organic precursors (Diethyl Zinc, Tertiarybutyl arsine, Tertiarybutyl phosphine, Trimethyl Aluminum, Trimethyl Gallium and Trimethyl Indium)
– Upon initiation, will deflagrate or detonate regardless of confinement
– Is potentially reactive when used in semiconductor processes that include, but are not limited to, Epitaxy (EPI), Metal Organic Chemical Vapor Deposition (MOCVD) and Atomic Layer Deposition (ALD) processes
– Is potentially reactive when used in certain optoelectronic and/or photovoltaic applications
Is classified as an unstable reactive and/or water reactive material by the National Fire Protection Association Standard NFPA 704 “Standard System for the Identification of the Hazards of Materials for Emergency Response”

• Flammable silicon compounds such as silane, disilane, methyl silane, trisilane are not within the scope of this document, however some organosilanes and chlorosilanes are within scope

3. Formal linkages with TFs in other Regions/Locales: (Show each associated TF and its parent global technical committee; indicate nature of relationship – global TF, observer TF, etc.)
Japan EHS Committee
Taiwan EHS Committee
Korea EHS Working Group

4. Formation Date:(TF formed on)

Task Force formed on: 07/01/2014
Task Force approved by Committee/GCS on: 07/01/2014

Staff Note: Approved via EHS GCS.
July 2017: New leaders appointed