SEMI International Standards
Standards Locale: Europe
Committee: Silicon Wafer
Place of Meeting: International Congress Center München (ICM), München, Germany
Date of Meeting: 11/14/2024
Meeting End Date: 11/14/2024
Recording SEMI Standards Staff: Laura Nguyen
CER Posted to Web: 11/27/2024
Leadership Changes
None.
TC Chapter Structure Changes
None.
Ballot Results
Document # | Document Title | TC Chapter Action | A&R Forms for Approved Ballots |
| 7192 | Revision of SEMI M73-1013E (Reapproved 1019), Test Method for Extracting Relevant Characteristics from Measured Wafer Edge Profiles | Passed, as balloted. |  7192_ProceduralReview.pdf |
| 7261 | Reapproval of SEMI M53-0220, Practice for Calibrating Scanning Surface Inspection Systems Using Certified Depositions of Monodisperse Reference Spheres on Unpatterned Semiconductor Wafer Surfaces | Passed, as balloted. |  7261_ProceduralReview.pdf |
| 7262 | Reapproval Of SEMI M58-1109 (Reapproved 0320) Test Method For Evaluating DMA Based Particle Deposition Systems And Processes | Passed, as balloted. |  7262_ProceduralReview.pdf |
| 7263 | Line-Item Revision of SEMI M35-1114 (Reapproved 1019) Guide For Developing Specifications For Silicon Wafer Surface Features Detected By Automated Inspection |  |  7263_ProceduralReview.pdf |
| L1 | Removal of “Shall” in section 7 to conform with SEMI Style Manual. | Passed, as balloted. | |
| 7264 | Line-Item Revision of SEMI M52-0923 Guide for Specifying Scanning Surface Inspection Systems for Silicon Wafers for the 130 nm to 5 nm Technology Generations | |  7264_ProceduralReview.pdf |
| L1 | Change §4.1 to “Acronyms and Abbreviations” and §4.2 to “Definitions” to conform to SEMI Standards Style and SEMI Standards Procedure Manuals, renumbering subsequent subsections as needed. | Passed, as balloted. | |
| L2 | Revise §4.2.3, the definition of LSE: include particle shape as well as material; use particle size instead of diameter; avoid use of “nmLSE” because it is not an SI unit. Revise NOTE 1 to conform to changes in §4.2.3. | Passed, as balloted. | |
| L3 | Eliminate references to 450mm wafer SEMI Standards M80, M158, and M159 in §3.1; eliminate mention of 450mm wafers from Table 2, line items 1.2.1, 1.2.2, and 1.2.6. Eliminate mention of 450 mm wafers from Table 3, line item 4.1; eliminate Table 3, line items 1.3 and 5.1.3 entirely. | Passed, as balloted. | |
NOTE 1: Passed ballots and line items will be submitted to the ISC Audit & Review Subcommittee for procedural review.
NOTE 2: Failed ballots and line items were returned to the originating task forces for re-work and re-balloting or abandoning.
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
None.
Authorized Activities
None.
Authorized Ballots
None.
SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
None.
Special Announcements of the Committee (Workshops, Programs, etc.)
None.
Next Meeting
SEMICON Europa 2025, details TBD. Check www.semi.org/standards for the latest update.
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